CORC

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CORC

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Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device 期刊论文
Journal of Alloys and Compounds, 2019, 页码: 543-549
作者:  Ma, Pengfei;  Sun, Jiamin;  Zhang, Guanqun;  Liang, Guangda;  Xin, Qian
收藏  |  浏览/下载：6/0  |  提交时间：2019/12/11
Low-temperature fabrication of HfAlO alloy dielectric using atomic-layer deposition and its application in a low-power device 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 792, 页码: 543-549
作者:  Ma, Pengfei;  Sun, Jiamin;  Zhang, Guanqun;  Liang, Guangda;  Xin, Qian
收藏  |  浏览/下载：14/0  |  提交时间：2019/12/11
Stress-induced charge trapping and electrical properties of atomic-layer-deposited HfAlO/Ga2O3 metal-oxide-semiconductor capacitors 期刊论文
2019, 卷号: 52
作者:  Zhang, Hongpeng;  Yuan, Lei;  Jia, Renxu;  Tang, Xiaoyan;  Hu, Jichao
收藏  |  浏览/下载：8/0  |  提交时间：2019/12/20
Potential solution-induced HfAlO dielectrics and their applications in low-voltage-operating transistors and high-gain inverters 期刊论文
RSC ADVANCES, 2018, 卷号: Vol.8 No.64, 页码: 36584-36595
作者:  Chen, Xiaoshuang;  Li, Wendong;  He, Gang;  Zhang, Miao;  Sun, Zhaoqi
收藏  |  浏览/下载：4/0  |  提交时间：2019/04/24
Potential solution-induced HfAlO dielectrics and their applications in low-voltage-operating transistors and high-gain inverters 期刊论文
RSC Advances, 2018, 卷号: Vol.8 No.64, 页码: 36584-36595
作者:  Chen, Xiaoshuang;  Li, Wendong;  He, Gang;  Zhang, Miao;  Sun, Zhaoqi
收藏  |  浏览/下载：3/0  |  提交时间：2019/04/24
Interface chemistry and electronic structure of ALD-derived HfAlO/Ge gate stacks revealed by X-ray photoelectron spectroscopy 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 716, 期号: 无, 页码: 1-6
作者:  He, Gang;  Jiang, Shanshan;  Li, Wendong;  Zheng, Changyong;  He, Huaxin
收藏  |  浏览/下载：38/0  |  提交时间：2018/05/25
Modulation of interfacial and electrical properties of ALD-derived HfAlO/Al2O3/Si gate stack by annealing temperature 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 691, 期号: 无, 页码: 504-513
作者:  Gao, J.;  He, G.;  Liu, M.;  Lv, J. G.;  Sun, Z. Q.
收藏  |  浏览/下载：18/0  |  提交时间：2017/11/21
Influence of HfAlO Composition on Resistance Ratio of RRAM with Ti electrode 会议论文
作者:  Qi, Yanfei;  Fang, Yuxiao;  Zhao, Chun;  Lu, Qifeng;  Liu, Chenguang
收藏  |  浏览/下载：3/0  |  提交时间：2019/11/26
Band Offsets and Interfacial Properties of HfAlO Gate Dielectric Grown on InP by Atomic Layer Deposition 期刊论文
NANOSCALE RESEARCH LETTERS, 2017, 卷号: 12, 页码: -
作者:  Yang, LF;  Wang, T;  Zou, Y;  Lu, HL
收藏  |  浏览/下载：17/0  |  提交时间：2017/12/08
Modulation of electrical properties and current conduction mechanism of HfAlO/Ge gate stack by ALD-derived Al2O3 passivation layer 期刊论文
Journal of Alloys and Compounds, 2017, 卷号: Vol.695, 页码: 1591-1599
作者:  Li,W. D.;  Jin,P.;  Wei,H. H.;  Xiao,X. D.;  Gao,J.
收藏  |  浏览/下载：4/0  |  提交时间：2019/04/22

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