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Identification of induced reaction during XPS depth profile measurements of CeO2/Si films grown by ion beam epitaxy 期刊论文
vacuum, 1998, 卷号: 49, 期号: 2, 页码: 133-137
Wu Z; Huang D; Yang X; Wang J; Qin F; Zhang J; Yang Z
收藏  |  浏览/下载:36/0  |  提交时间:2010/08/12
A study of the interface of CeO2/Si heterostructure grown by ion beam deposition 期刊论文
vacuum, 1998, 卷号: 51, 期号: 3, 页码: 397-401
Wu ZL; Huang DD; Yang XZ
收藏  |  浏览/下载:38/0  |  提交时间:2010/08/12
Mechanism of induced reaction during XPS depth profile measurements of CeO2/Si films grown by ion beam epitaxy 期刊论文
vacuum, 1998, 卷号: 49, 期号: 2, 页码: 139-143
Yang X; Wu Z; Zhao J; Wang H; Huang D; Qin F
收藏  |  浏览/下载:28/0  |  提交时间:2010/08/12


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