×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
北京大学 [27]
清华大学 [3]
兰州大学 [3]
西安交通大学 [2]
西安理工大学 [2]
沈阳自动化研究所 [2]
更多...
内容类型
期刊论文 [38]
其他 [5]
会议论文 [4]
学位论文 [2]
发表日期
2022 [1]
2021 [1]
2020 [1]
2019 [1]
2018 [3]
2017 [2]
更多...
学科主题
712.1.2 Co... [1]
714.1 Elec... [1]
931.3 Atom... [1]
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共49条,第1-10条
帮助
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
The effect of nonideal boundary condition on instability of THz plasma waves in quantum field-effect transistors
期刊论文
AIP Advances, 2022, 卷号: 12, 期号: 3
作者:
Zhang, Li-Ping
;
Liu, Chen-Xiao
;
Feng, Jiang-Xu
;
Su, Jun-Yan
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2022/04/21
Boundary conditions
Capacitance
Plasma diagnostics
Plasma stability
Plasma waves
Terahertz waves
Field-effect transistor
Gate source capacitance
Gate-drain capacitance
In-field
New mechanisms
Nonideal
Quantum effects
Quantum field
Quantum-hydrodynamic models
THz waves
A Charge Density Model of Silicon-nanowire GAA MOSFET Incoroperating the Source-drian Tunneling Effect for IC Design
会议论文
Guilin, China, June 4-6, 2021
作者:
Cheng H(程贺)
;
Zhang C(张超)
;
Liu TF(刘铁锋)
;
Xie C(谢闯)
;
Yang ZJ(杨志家)
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2022/02/04
ballistic transport
compact model
integrated-cricuit design
sub-7 nm GAA MOSFET
the source-drain tunneling
Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling
期刊论文
Japanese Journal of Applied Physics, 2020, 卷号: 59, 期号: 7, 页码: 1-9
作者:
Cheng H(程贺)
;
Liu TF(刘铁锋)
;
Zhang C(张超)
;
Liu ZF(刘志峰)
;
Yang ZJ(杨志家)
收藏
  |  
浏览/下载:15/0
  |  
提交时间:2020/07/11
ballistic transport
cylindrical gate-allaround (GAA) MOSFET
compact model
Wentzel-Kramers-Brillouin (WKB) approximation
the source-to-drain tunneling
Device scaling considerations for sub-90-nm 2-bit/cell split-gate flash memory cell
期刊论文
Solid-State Electronics, 2019, 卷号: 152, 页码: 46-52
作者:
Xu, Zhaozhao
;
Liu, Donghua
;
Hu, Jun
;
Chen, Wenjie
;
Qian, Wensheng
收藏
  |  
浏览/下载:2/0
  |  
提交时间:2019/11/19
2-bit/cell
Device-scaling
Drain induced barrier lowering effects
Source-side injection
Split gates
Effects of ultra-thin Si-fin body widths upon SOI PMOS FinFETs
期刊论文
MODERN PHYSICS LETTERS B, 2018, 卷号: 32, 期号: 15
作者:
Liaw, Yue-Gie
;
Chen, Chii-Wen
;
Liao, Wen-Shiang
;
Wang, Mu-Chun
;
Zou, Xuecheng
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2019/12/05
SOI FinFET
threshold voltage (V-t)
drive current
short channel effect (SCE)
swing
transconductance (G(m))
drain-induced barrier lowering (DIBL)
source/drain resistance (R-SD)
The Security Protection of SiC MOSFET NPC Tri-level Converter
会议论文
2018 1ST WORKSHOP ON WIDE BANDGAP POWER DEVICES AND APPLICATIONS IN ASIA (WIPDA ASIA), 2018-01-01
作者:
Wu, Wenjun
;
Cai, Yuxi
;
Wang, Wenxuan
;
Cui, Dongjie
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2019/12/20
SiC MOSFET
drain-source voltage
over-current protection
tri-level
voltage balanced
leakage current
Improving ESD Protection Robustness Using SiGe Source/Drain Regions in Tunnel FET
期刊论文
2018, 卷号: 9
作者:
Yang, Zhaonian
;
Yang, Yuan
;
Yu, Ningmei
;
Liou, Juin J.
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2019/12/20
band-to-band tunneling (BTBT)
electrostatic discharge (ESD)
tunnel field-effect transistor (TFET)
Silicon-Germanium source
drain (SiGe S
D)
technology computer aided design (TCAD)
Source-drain resistance characteristics of back-channel etched amorphous InGaZnO thin film transistors with TiO2:Nb protective layer
期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2017
Zhang, Letao
;
Zhou, Xiaoliang
;
Chang, Baozhu
;
Wang, Longyan
;
Xiao, Yuxiang
;
He, Hongyu
;
Zhang, Shengdong
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2017/12/03
Amorphous indium gallium zinc oxide
Thin film transistors
Source-drain parasitic resistance
TiO2:Nb
Films thickness
THRESHOLD VOLTAGE
ANATASE TIO2
PERFORMANCE
SHIFT
TFTS
Fabrication and characterization of gate last Si MOSFETs with SiGe source and drain
学位论文
: KTH, 2017
作者:
Christensen,Björn
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2019/12/24
MOSFET
fabrication
gate
last
SiGe
source
and
drain
IDP
gate
epitaxy
MOSFET
fabrication
gate
last
SiGe
source
and
drain
IDP
gate
epitaxy
Electrical
Engineering
Electronic
Engineering
Information
Engineering
Elektroteknik
och
elektronik
Sn-doped ZnO thin-film transistors with AZO, TZO and Al heterojunction source/drain contacts
期刊论文
ELECTRONICS LETTERS, 2016
Zhang, Yi
;
Han, Dedong
;
Huang, Lingling
;
Dong, Junchen
;
Cong, Yingying
;
Cui, Guodong
;
Zhang, Xiaomi
;
Zhang, Xing
;
Zhang, Shengdong
;
Wang, Yi
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2017/12/03
thin film transistors
electrical contacts
tin
zinc compounds
indium compounds
tin compounds
tin-doped zinc oxide thin-film transistors
heterojunction source-drain contacts
bottom gate
top contact thin-film transistors
glass substrate
indium tin oxide thin films
alumni zinc oxide thin films
AZO thin films
aluminium thin films
AZO S-D electrode
saturation mobility
subthreshold slope
on-off current ratio
output characteristic
parasitic resistance
contact performance
t
©版权所有 ©2017 CSpace - Powered by
CSpace