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	All-Silicon Topological Semimetals with Closed Nodal Line 期刊论文 JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2019, 卷号: 10, 页码: 244-250 作者: Liu, Zhifeng; Xin, Hongli 收藏 \| 浏览/下载：2/0 \| 提交时间：2019/12/02 Calculations Electronic properties Quantum theory Semiconductor device manufacture Semiconductor devices Topology Zeolites, First-principles calculation Nontrivial topology Semiconductor industry Si-based devices Spin-orbit couplings Structural and electronic properties Symmetry-breaking Time reversal symmetries, Semiconducting silicon
	Investigation of effects of pattern structures arrangement on chemical mechanical polishing process 会议论文 Shanghai, China, March 11, 2018 - March 12, 2018 作者: Wu, Lixiao; Hahn, Sookap; Yan, Changfeng 收藏 \| 浏览/下载：1/0 \| 提交时间：2020/11/15 Chemical mechanical polishing Pressure distribution Semiconductor device manufacture Signal processing Silicon wafers Textile printing Chemical-mechanical polishing process Contact pressure distribution Pattern arrangement Pattern structure Polishing processs Splitting signals
	Frequency Offset-Based Ring Oscillator Physical Unclonable Function 期刊论文 IEEE Transactions on Multi-Scale Computing Systems, 2018, 卷号: Vol.4 No.4, 页码: 711-721 作者: Jiliang Zhang; Xiao Tan; Yuanjing Zhang; Weizheng Wang; Zheng Qin 收藏 \| 浏览/下载：10/0 \| 提交时间：2019/12/26 Semiconductor device manufacture Inverters Security Ring oscillators Internet of Things Field programmable gate arrays Hardware security physical unclonable function ring oscillator reliability
	High power vcsel laser treatment device with skin cooling function and packaging structure thereof 专利专利号: EP3219360A1, 申请日期: 2017-09-20, 公开日期: 2017-09-20 作者: LI, YANG; LI, DELONG 收藏 \| 浏览/下载：5/0 \| 提交时间：2020/01/18
	Model quality evaluation in semiconductor manufacturing process with EWMA run-to-run control (EI收录) 期刊论文 IEEE Transactions on Semiconductor Manufacturing, 2017, 卷号: 30, 页码: 8-16 作者: Zheng, Ying[1]; Ling, Dan[1]; Wang, Yan-Wei[2]; Jang, Shi-Shang[3]; Tao, Bo[4] 收藏 \| 浏览/下载：10/0 \| 提交时间：2019/04/24 Chemical mechanical polishing Chemical polishing Controllers Least squares approximations Manufacture Quality control Semiconductor device manufacture White noise
	CMOS图像传感器辐射效应的测试技术学位论文硕士, 北京: 中国科学院大学, 2016 作者: 王帆收藏 \| 浏览/下载：9/0 \| 提交时间：2016/09/27 CMOS图像传感器测试方法辐射效应电离总剂量效应位移损伤效应 RTS噪声
	Modeling of evolution process of edge over erosion in copper CMP using frequency components algorithm 会议论文 Shanghai, China, March 13, 2016 - March 14, 2016 作者: Wu, Lixiao; Hahn, Sookap; Yan, Changfeng 收藏 \| 浏览/下载：2/0 \| 提交时间：2020/11/15 Copper Linear systems Polishing Semiconductor device manufacture Silicon wafers Textile printing Copper CMP Evolution process Frequency components Pattern density Pattern structure Polishing processs Square waves Wafer patterns
	Feature Scale Simulation of PECVD of SiO_2 in SiH_4/N_2O Mixture 期刊论文 2016, 2016 刘璇; 葛婕; 杨轶; 宋亦旭; 任天令; LIU Xuan; GE Jie; YANG Yi; SONG Yixu; REN Tianling 收藏 \| 浏览/下载：8/0
	Semiconductor performance of rare earth gadolinium-doped aluminum-zinc oxide thin film 期刊论文 RARE METALS, 2016 Dong, Jun-Chen; Han, De-Dong; Zhao, Fei-Long; Zhao, Nan-Nan; Wu, Jing; Liu, Li-Feng; Kang, Jin-Feng; Wang, Yi 收藏 \| 浏览/下载：4/0 \| 提交时间：2017/12/04 Rare earth Gd-AZO thin film Optical properties Electrical properties Semiconductor properties TRANSISTORS
	An analytical model of effects of 2-D pad surface textures on contact pressure distribution during CMP 会议论文 Shanghai, China, March 15, 2015 - March 16, 2015 作者: Wu, Lixiao; Yan, Changfeng 收藏 \| 浏览/下载：1/0 \| 提交时间：2020/11/15 Numerical methods Pressure distribution Semiconductor device manufacture Silicon wafers Textures Analytical results Contact pressure distribution Contact pressures Numerical results Pad asperities Polishing processs Simulation data Surface textures

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