已选(0)清除
条数/页: 排序方式:
|
| Enhancing the thermal stability of NiGe by prior-germanidation fluorine implantation into Ge substrate 期刊论文 Japanese Journal of Applied Physics, 2018 作者: Zhang D(张丹); Wang WW(王文武); Chen DP(陈大鹏); Li JF(李俊峰); Liu S(刘实) 收藏  |  浏览/下载:21/0  |  提交时间:2019/05/20 |
| 面向先进CMOS技术节点的NiSi和NiGe接触技术研究 学位论文 : 中国科学院大学, 2018 作者: 段宁远 收藏  |  浏览/下载:14/0  |  提交时间:2018/09/05 |
| Reduction of NiGe/n-and p-Ge Specific Contact Resistivity by Enhanced Dopant Segregation in the Presence of Carbon During Nickel Germanidation 期刊论文 IEEE Transactions on Electron Devices, 2016 作者: Duan NY(段宁远); Wang GL(王桂磊); Liu JB(刘金彪); Eddy simoen; Mao SJ(毛淑娟) 收藏  |  浏览/下载:15/0  |  提交时间:2017/05/09 |
| Thermal Stability Improvement of Nickel Germanide Utilizing Nitrogen Plasma Pretreatment for Germanium-Based Technology 其他 2016-01-01 Zhang, Bingxin; An, Xia; Liu, Pengqiang; Li, Ming; Lin, Meng; Hao, Peilin; Zhang, Xing; Huang, Ru 收藏  |  浏览/下载:1/0  |  提交时间:2017/12/03
|
| Influence of interface structure on electrical properties of NiGe/Ge contacts 期刊论文 JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 卷号: 54, 期号: 5, 页码: 6 作者: Deng, Yunsheng; Nakatsuka, Osamu; Sakashita, Mitsuo; Zaima, Shigeaki 收藏  |  浏览/下载:8/0  |  提交时间:2018/03/15 |
| Effects of carbon pre-germanidation implant into Ge on the thermal stability of NiGe films 期刊论文 Microelectronic engineering, 2015 作者: Liu QB(刘庆波); Ke XX(柯星星); Guo YL(郭奕栾); Zhao C(赵超); Wang GL(王桂磊) 收藏  |  浏览/下载:11/0  |  提交时间:2016/05/31 |
| Effects of carbon pre-germanidation implantation on the thermal stability of NiGe and dopant segregation on both n- and p-type Ge substrate 期刊论文 ECS Journal of Solid State Science and Technology, 2015 作者: Zhao C(赵超); Liu QB(刘庆波); Wang GL(王桂磊); Duan NY(段宁远); Liu HW(刘宏伟) 收藏  |  浏览/下载:16/0  |  提交时间:2016/05/31 |
| Effects of carbon pre-germanidation implant into Ge on the thermal stability of NiGe films 期刊论文 MICROELECTRONIC ENGINEERING, 2015, 卷号: 133, 页码: 6-10 作者: Liu, Qingbo; Wang, Guilei; Guo, Yiluan; Ke, Xingxing; Radamson, Henry 收藏  |  浏览/下载:5/0  |  提交时间:2019/12/17
|
| Effects of Carbon Pre-Germanidation Implantation on the Thermal Stability of NiGe and Dopant Segregation on Both n- and p-Type Ge Substrate 期刊论文 ECS Journal of Solid State Science and Technology, 2015, 卷号: 4, 期号: 5, 页码: P119-P123 作者: Liu, Qingbo; Wang, Guilei; Duan, Ningyuan; Radamson, Henry; Liu, Hong 收藏  |  浏览/下载:3/0  |  提交时间:2019/12/17 |
| Ge/SiGe异质结构肖特基源漏MOSFET 期刊论文 2014 张茂添; 刘冠洲; 李成; 王尘; 黄巍; 赖虹凯; 陈松岩 收藏  |  浏览/下载:5/0  |  提交时间:2016/05/17
|