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科研机构
半导体研究所 [10]
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期刊论文 [8]
会议论文 [2]
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2011 [1]
2009 [1]
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半导体材料 [10]
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Investigation of cracks in GaN films grown by combined hydride and metal organic vapor-phase epitaxial method
期刊论文
nanoscale research letters, 2011, 卷号: 6, 页码: article no.69
作者:
Song HP
;
Wei HY
;
Li CM
;
Jiao CM
收藏
  |  
浏览/下载:66/4
  |  
提交时间:2011/07/05
CATHODOLUMINESCENCE CHARACTERIZATION
GALLIUM NITRIDE
STRESSES
LAYERS
HETEROSTRUCTURE
DEPOSITION
CONSTANTS
MECHANISM
SAPPHIRE
STRAIN
Stress and resistivity controls on in situ boron doped LPCVD polysilicon films for high-Q MEMS applications
期刊论文
半导体学报, 2009, 卷号: 30, 期号: 8, 页码: 34-38
Xie Jing
;
Liu Yunfei
;
Yang Jinling
;
Tang Longjuan
;
Yang Fuhua
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2010/11/23
Crack control in GaN grown on silicon (111) using In doped low-temperature AlGaN interlayer by metalorganic chemical vapor deposition
期刊论文
optical materials, 2006, 卷号: 28, 期号: 10, 页码: 1227-1231
Wu JJ (Wu Jiejun)
;
Han XX (Han Xiuxun)
;
Li JM (Li Jiemin)
;
Wei HY (Wei Hongyuan)
;
Cong GW (Cong Guangwei)
;
Liu XL (Liu Xianglin)
;
Zhu QS (Zhu Qinsheng)
;
Wang ZG (Wang Zhanguo)
;
Jia QJ (Jia Quanjie)
;
Guo LP (Guo Liping)
;
Hu TD (Hu Tiandou)
;
Wang HH (Wang Huanhua)
收藏
  |  
浏览/下载:49/0
  |  
提交时间:2010/04/11
in doping
cracks
Si(111) substrate
LT-AlGaN interlayer
metalorganic chemical vapor deposition
GaN
PHASE EPITAXY
INDIUM-SURFACTANT
OPTICAL-PROPERTIES
SI(111)
STRESS
FILMS
Depth distribution of the strain in the GaN layer with low-temperature AlN interlayer on Si(111) substrate studied by Rutherford backscattering/channeling
期刊论文
applied physics letters, 2004, 卷号: 85, 期号: 23, 页码: 5562-5564
Lu, Y
;
Cong, GW
;
Liu, XL
;
Lu, DC
;
Wang, ZG
;
Wu, MF
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  |  
浏览/下载:21/0
  |  
提交时间:2010/03/17
STRESS
Hydrogen behavior in GaN epilayers grown by NH3-MBE
期刊论文
journal of crystal growth, 2001, 卷号: 227, 期号: 0, 页码: 371-375
Kong MY
;
Zhang JP
;
Wang XL
;
Sun DZ
收藏
  |  
浏览/下载:99/8
  |  
提交时间:2010/08/12
impurities
molecular beam epitaxy
nitrides
semiconducting III-V materials
GALLIUM NITRIDE
SAPPHIRE SUBSTRATE
DEFECTS
HETEROSTRUCTURE
SEMICONDUCTORS
STRESS
Hydrogen behavior in GaN epilayers grown by NH3-MBE
会议论文
11th international conference on molecular beam epitaxy (mbe-xi), beijing, peoples r china, sep 11-15, 2000
Kong MY
;
Zhang JP
;
Wang XL
;
Sun DZ
收藏
  |  
浏览/下载:12/0
  |  
提交时间:2010/11/15
impurities
molecular beam epitaxy
nitrides
semiconducting III-V materials
GALLIUM NITRIDE
SAPPHIRE SUBSTRATE
DEFECTS
HETEROSTRUCTURE
SEMICONDUCTORS
STRESS
Hydrogen-dependent lattice dilation in GaN
期刊论文
semiconductor science and technology, 2000, 卷号: 15, 期号: 6, 页码: 619-621
Zhang JP
;
Wang XL
;
Sun DZ
;
Kong MY
收藏
  |  
浏览/下载:36/0
  |  
提交时间:2010/08/12
OPTICAL-PROPERTIES
GALLIUM NITRIDE
SAPPHIRE
EPILAYERS
STRESS
SEMICONDUCTORS
ELECTRONS
SILICON
STRAIN
FILMS
Electrical properties of GaN deposited on nitridated sapphire by molecular beam epitaxy using NH3 cracked on the growing surface
会议论文
10th international conference on molecular beam epitaxy (mbe-x), cannes, france, aug 31-sep 04, 1998
Zhang JP
;
Sun DZ
;
Li XB
;
Wang XL
;
Kong MY
;
Zeng YP
;
Li JM
;
Lin LY
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2010/11/15
STRESS
GROWTH
Electrical properties of GaN deposited on nitridated sapphire by molecular beam epitaxy using NH3 cracked on the growing surface
期刊论文
journal of crystal growth, 1999, 卷号: 201, 期号: 0, 页码: 429-432
Zhang JP
;
Sun DZ
;
Li XB
;
Wang XL
;
Kong MY
;
Zeng YP
;
Li JM
;
Lin LY
收藏
  |  
浏览/下载:33/0
  |  
提交时间:2010/08/12
GaN
hydrogen contaminant
GSMBE
Raman spectrum
GROWTH
STRESS
Some properties of gallium nitride films grown on (0001) oriented sapphire substrates by gas source molecular beam epitaxy
期刊论文
journal of crystal growth, 1997, 卷号: 180, 期号: 1, 页码: 27-33
Yoon SF
;
Li XB
;
Kong MY
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2010/11/17
LIGHT-EMITTING DIODES
RAMAN-SCATTERING
TEMPERATURE
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