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科研机构
半导体研究所 [27]
内容类型
期刊论文 [22]
会议论文 [5]
发表日期
2011 [1]
2006 [4]
2005 [2]
2003 [3]
2002 [2]
2001 [6]
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半导体材料 [27]
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Effect of high temperature AlGaN buffer thickness on GaN Epilayer grown on Si(111) substrates
期刊论文
journal of materials science-materials in electronics, 2011, 卷号: 22, 期号: 8, 页码: 1028-1032
作者:
Pan X
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浏览/下载:20/0
  |  
提交时间:2011/09/14
CHEMICAL-VAPOR-DEPOSITION
PHASE EPITAXY
ALN INTERLAYERS
FILMS
STRESS
LAYERS
DISLOCATIONS
REDUCTION
DENSITY
DIODES
Electrical properties of undoped In0.53Ga0.47As grown on InP substrates by molecular beam epitaxy
期刊论文
journal of crystal growth, 2006, 卷号: 293, 期号: 2, 页码: 291-293
Cui LJ (Cui L. J.)
;
Zeng YP (Zeng Y. P.)
;
Wang BQ (Wang B. Q.)
;
Zhu ZP (Zhu Z. P.)
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浏览/下载:20/0
  |  
提交时间:2010/04/11
characterization
point defects
molecular beam epitaxy
semiconducting gallium compounds
semiconducting indium compounds
semiconducting ternary compounds
1.55 MU-M
QUANTUM-WELLS
TEMPERATURE
GAAS
1.55-mu m resonant cavity enhanced photodiode based on MBE grown Ge quantum dots
会议论文
4th international conference on silicon epitaxy and heterostructures, awaji isl, japan, may 23-26, 2005
Yu, J
;
Kasper, E
;
Oehme, M
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浏览/下载:146/20
  |  
提交时间:2010/03/29
SiGe
1.55-mu m resonant cavity enhanced photodiode based on MBE grown Ge quantum dots
期刊论文
thin solid films, 2006, 卷号: 508, 期号: 1-2, 页码: 396-398
Yu J
;
Kasper E
;
Oehme M
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浏览/下载:63/0
  |  
提交时间:2010/04/11
SiGe
photodiode
MBE
quantum dots
PHOTODETECTORS
OPERATION
Study on surface morphology of GaN growth by MOCVD on GaN/Si(111) template
期刊论文
journal of rare earths, 2006, 卷号: 24, 期号: sp.iss.si, 页码: 40495
Liu Z
;
Wang JX
;
Wang XL
;
Hu GX
;
Guo LC
;
Liu HX
;
Li JP
;
Li JM
;
Zeng YP
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  |  
浏览/下载:44/0
  |  
提交时间:2010/04/11
surface morphology
GaN/Si template
GaN
MOCVD
ALLOYS
MOVPE
Research progress of electronic properties of self-assembled semiconductor quantum dots
期刊论文
acta metallurgica sinica, 2005, 卷号: 41, 期号: 5, 页码: 463-470
作者:
Jin P
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浏览/下载:48/13
  |  
提交时间:2010/03/17
self-assembled semiconductor quantum dot
Optical properties of self-assembled InAs/InAlAs/InP quantum wires with different InAs deposited thickness
期刊论文
journal of crystal growth, 2005, 卷号: 286, 期号: 1, 页码: 23-27
作者:
Jin P
;
Xu B
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浏览/下载:58/0
  |  
提交时间:2010/04/11
defects
lateral composition modulation
photoluminescence
molecular beam epitaxy
quantum wires
semiconductor III-V material
DOTS
HETEROSTRUCTURES
INALAS/INP(001)
SPECTROSCOPY
WAVELENGTH
INP(001)
Strain accommodation of 3C-SiC grown on hydrogen-implanted Si (001) substrate
期刊论文
journal of crystal growth, 2003, 卷号: 257, 期号: 3-4, 页码: 321-325
作者:
Li DB
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浏览/下载:59/0
  |  
提交时间:2010/08/12
substrate
heteroepitaxy
low pressure chemical vapor deposition
semiconducting silicon carbide
COMPLIANT SUBSTRATE
CRITICAL THICKNESS
SILICON
RELAXATION
MECHANISM
DEFECTS
LAYERS
Optical investigation on the annealing effect and its mechanism of GaInAs/GaNAs quantum wells
期刊论文
journal of crystal growth, 2003, 卷号: 253, 期号: 1-4, 页码: 155-160
作者:
Jiang DS
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  |  
浏览/下载:56/0
  |  
提交时间:2010/08/12
interdiffusion
post-annealing
quantum wells
GaInNAs/GaAs
MOLECULAR-BEAM EPITAXY
CARRIER LOCALIZATION
GAINNAS
LUMINESCENCE
ORIGIN
GAASN
Microstructure of GaN films grown on Si(111) substrates by metalorganic chemical vapor deposition
期刊论文
journal of crystal growth, 2003, 卷号: 256, 期号: 3-4, 页码: 416-423
Hu GQ
;
Kong X
;
Wan L
;
Wang YQ
;
Duan XF
;
Lu Y
;
Liu XL
收藏
  |  
浏览/下载:25/0
  |  
提交时间:2010/08/12
amorphous layer
dislocation
transmission electron microscopy
metalorganic chemical vapor deposition
GaN
MOLECULAR-BEAM EPITAXY
HIGH-QUALITY GAN
HETEROEPITAXIAL GROWTH
ELECTRON-DIFFRACTION
DEFECT STRUCTURE
HETEROSTRUCTURE
DISLOCATIONS
MICROSCOPY
(111)SI
LAYER
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