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科研机构
大连理工大学 [731]
内容类型
期刊论文 [549]
会议论文 [172]
专利 [9]
无文献类型 [1]
发表日期
2020 [3]
2019 [66]
2018 [68]
2017 [60]
2016 [73]
2015 [66]
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专题:大连理工大学
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Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology
期刊论文
Journal of nanoscience and nanotechnology, 2020, 卷号: 20, 页码: 2508-2513
作者:
Cheng E
;
Tang Suzhou
;
Li Chen
;
Zou Helin
;
Wei Qiang
收藏
  |  
浏览/下载:67/0
  |  
提交时间:2019/12/02
Fabrication of micro pits based on megasonic assisted through-mask electrochemical micromachining
期刊论文
Ultrasonics, 2020, 卷号: 100, 页码: 105990
作者:
Zhai Ke
;
Du Liqun
;
Wen Yikui
;
Wang Shuxuan
;
Cao Qiang
收藏
  |  
浏览/下载:66/0
  |  
提交时间:2019/12/02
Deep etching capability,Electrolytic conductivity,Etching factor,Megasonic,Micro pit,Through-mask electrochemical micromachining
A microfluidic platform culturing two cell lines paralleled under in-vivo like fluidic microenvironment for testing the tumor targeting of nanoparticles
期刊论文
Talanta, 2020, 卷号: 208
作者:
Wei, Juan
;
Cheng, Lichun
;
Li, Jingmin
;
Liu, Yuanchang
;
Yin, Shuqing
收藏
  |  
浏览/下载:55/0
  |  
提交时间:2019/12/02
Study of acetic acid addition on properties of PZT films prepared by sol-gel method
期刊论文
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2019, 卷号: 30, 页码: 9194-9199
作者:
Cui, Yan
;
Gu, Wang
;
Kong, Xiangxin
;
Gao, Zhidong
;
Yu, Shunyao
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2019/12/02
Acetic acid
Crystal orientation
Ferroelectric films
Ferroelectricity
Lead compounds
Perovskite
pH
Sols
Thin films
X ray diffraction analysis
Zirconium compounds, Acid addition
Dielectric and ferroelectric properties
Ferroelectric property
Gel method
Perovskite structures
PZT film
PZT thin film
Relative dielectric constant, Film preparation
Flexible bioelectrodes with enhanced wrinkle microstructures for reliable electrochemical modification and neuromodulation in vivo
期刊论文
BIOSENSORS & BIOELECTRONICS, 2019, 卷号: 135, 页码: 181-191
作者:
Ji, Bowen
;
Wang, Minghao
;
Ge, Chaofan
;
Xie, Zhaoqian
;
Guo, Zhejun
收藏
  |  
浏览/下载:76/0
  |  
提交时间:2019/12/02
Flexible bioelectrodes
Enhanced wrinkle microstructures
Electrochemical modification
ECoG recording
Optogenetics stimulation
Near-field microscopy inspection of nano scratch defects on the monocrystalline silicon surface
期刊论文
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2019, 卷号: 56, 页码: 506-512
作者:
Yan, Ying
;
Wang, Yonghao
;
Zhou, Ping
;
Huang, Ning
;
Guo, Dongming
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2019/12/02
s-SNOM
Surface defects
Micro crack
Smartphone-app based point-of-care testing for myocardial infarction biomarker cTnI using an autonomous capillary microfluidic chip with self-aligned on-chip focusing (SOF) lenses
期刊论文
LAB ON A CHIP, 2019, 卷号: 19, 页码: 1797-1807
作者:
Liang, Chao
;
Liu, Yuanchang
;
Niu, Aiying
;
Liu, Chong
;
Li, Jingmin
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2019/12/02
Influence of the Planetary Movement of Tool on the Aspect Ratio of Micro Holes Machined by Micro-Ultrasonic Machining
期刊论文
Journal of Micro and Nano-Manufacturing, 2019, 卷号: 7
作者:
Lei, Senwang
;
Yu, Zuyuan
;
Zhou, Kai
;
Li, Jianzhong
;
Kang, Renke
收藏
  |  
浏览/下载:16/0
  |  
提交时间:2019/12/02
Efficiency
Infill drilling
Ultrasonic cutting, Hard and brittle materials
High aspect ratio
Machining speed
Micro holes
Micro-tool
Micro-usm
Ultrasonic machining, Aspect ratio
Prediction of stress distribution in press-fit process of interference fit with a new theoretical model
期刊论文
PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART C-JOURNAL OF MECHANICAL ENGINEERING SCIENCE, 2019, 卷号: 233, 页码: 2834-2846
作者:
Wang, Xingyuan
;
Lou, Zhifeng
;
Wang, Xiaodong
;
Hao, Xiupeng
;
Wang, Yue
收藏
  |  
浏览/下载:58/0
  |  
提交时间:2019/12/02
Interference fit
press-fit process
stress distribution
stress concentration
theoretical model
Double-layer resist method to improve descum result when removing negative photoresist
期刊论文
MICRO & NANO LETTERS, 2019, 卷号: 14, 页码: 694-697
作者:
Yang, Zheng
;
Wang, Qiusen
;
Qi, Liping
;
Wang, Xing
;
Li, Kehong
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2019/12/02
photoresists
viscosity
etching
negative photoresist scum
low viscosity positive photoresist
AZ703
double-layer resist method
optimal retracting distance
bottom layer resist
top layer resist
top layer contact
size 8
0 mum
size 1
10 mum
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