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CORC

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Effect of geometry error on accuracy of large-diameter pads used for CMP dressing 期刊论文
International Journal of Advanced Manufacturing Technology, 2019, 卷号: 100, 页码: 1505-1520
作者:  Ban, X.X.;  Zhao, H.Y.;  Zhao, S.J.;  Xie, R.Q.;  Gu, Y.W.
收藏  |  浏览/下载：14/0  |  提交时间：2019/11/19
Insights into the atomistic behavior in diamond chemical mechanical polishing with center dot OH environment using ReaxFF molecular dynamics simulation 期刊论文
COMPUTATIONAL MATERIALS SCIENCE, 2019, 卷号: 166, 页码: 136-142
作者:  Shi, Zhuoying;  Jin, Zhuji;  Guo, Xiaoguang;  Yuan, Song;  Guo, Jiang
收藏  |  浏览/下载：5/0  |  提交时间：2019/12/02
Precision Fabrication of Thin Copper Substrate by Double-sided Lapping and Chemical Mechanical Polishing 期刊论文
JOURNAL OF MANUFACTURING PROCESSES, 2019, 卷号: 44, 页码: 47-54
作者:  Pan, Bo;  Kang, Renke;  Guo, Jiang;  Fu, Haiyang;  Du, Dongxing
收藏  |  浏览/下载：42/0  |  提交时间：2019/12/02
Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency 期刊论文
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2019, 卷号: 55, 页码: 14-21
作者:  Ou, Li -Wei;  Wang, Ya-Hui;  Hu, Hui-Qing;  Zhang, Liang-Liang;  Dong, Zhi-Gang
收藏  |  浏览/下载：10/0  |  提交时间：2019/12/02
A novel chemical mechanical polishing slurry for yttrium aluminum garnet crystal 期刊论文
APPLIED SURFACE SCIENCE, 2019, 卷号: 496
作者:  Zhang, Zili;  Jin, Zhuji;  Guo, Jiang;  Han, Xiaolong;  Mu, Qing
收藏  |  浏览/下载：11/0  |  提交时间：2019/12/02
Preparation of ellipsoidal rod-shaped silica nanocomposite abrasives by Chromium ion/PEG200 induced method for sapphire substrates chemical mechanical polishing 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 777, 页码: 1294-1303
作者:  Dong, Yue[1];  Lei, Hong[2];  Liu, Wenqing[3];  Chen, Yi[4]
收藏  |  浏览/下载：13/0  |  提交时间：2019/04/22
Highly efficient removal of sapphire by composite nanoabrasive with novel inorganic polyelectrolyte as a binder 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 782, 页码: 709-715
作者:  Wang, Tianxian[1];  Lei, Hong[2];  Dong, Yue[3];  Xu, Lei[4];  Dai, Sanwei[5]
收藏  |  浏览/下载：3/0  |  提交时间：2019/04/22
Silica Nano-particle Anneal Treatment and Its Effect on Chemical Mechanical Polishing 期刊论文
Journal of Electrical Engineering & Technology, 2019, 卷号: Vol.14 No.1, 页码: 355-361
作者:  Shibin Lu;  Ying Meng;  Haibo Wang;  Junning Chen;  Feifei Wang
收藏  |  浏览/下载：139/0  |  提交时间：2019/04/24
Investigation of effects of pattern structures arrangement on chemical mechanical polishing process 会议论文
Shanghai, China, March 11, 2018 - March 12, 2018
作者:  Wu, Lixiao;  Hahn, Sookap;  Yan, Changfeng
收藏  |  浏览/下载：1/0  |  提交时间：2020/11/15
Atomistic mechanisms of Cu CMP in aqueous H2O2: Molecular dynamics simulations using ReaxFF reactive force field 期刊论文
COMPUTATIONAL MATERIALS SCIENCE, 2018, 卷号: 155, 页码: 476-482
作者:  Guo, Xiaoguang;  Wang, Xiaoli;  Jin, Zhuji;  Kang, Renke
收藏  |  浏览/下载：5/0  |  提交时间：2019/12/02

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