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Quantitative Prediction of the Whole Peeling Process of an Elastic Film on a Rigid Substrate 期刊论文
JOURNAL OF APPLIED MECHANICS-TRANSACTIONS OF THE ASME, 2018, 卷号: 85, 期号: 9, 页码: Ar-91004
作者:  Yin HB;  Chen SH;  Liang LH(梁立红);  Peng ZL(彭志龙);  Wei YG(魏悦广)
收藏  |  浏览/下载：22/0  |  提交时间：2018/12/12
Mechanism of Three-Dimensional Surface Wrinkle Manipulation on a Compliant Substrate 期刊论文
JOURNAL OF APPLIED MECHANICS-TRANSACTIONS OF THE ASME, 2018, 卷号: 85
作者:  Li, Mengjie;  Qin, Huasong;  Liu, Jingran;  Liu, Yilun
收藏  |  浏览/下载：6/0  |  提交时间：2019/11/26
Characterization of oxidation film on SiC ceramic substrate based on indentation method 期刊论文
CERAMICS INTERNATIONAL, 2017
Qu, Zhaoliang; Zhang, Qiang; He, Rujie; Pei, Yongmao; Fang, Daining
收藏  |  浏览/下载：113/0  |  提交时间：2017/12/03
A two-dimensional Fourier-series finite element for wrinkling analysis of thin films on compliant substrates 期刊论文
THIN-WALLED STRUCTURES, 2017, 卷号: 114
作者:  Huang, Qun;  Xu, Rui;  Liu, Yin;  Hu, Heng;  Giunta, Gaetano
收藏  |  浏览/下载：3/0  |  提交时间：2019/12/05
Cylindrical nano-indentation on metal film/elastic substrate system with discrete dislocation plasticity analysis: A simple model for nano-indentation size effect 期刊论文
INTERNATIONAL JOURNAL OF SOLIDS AND STRUCTURES, 2010, 卷号: 47, 期号: 22-23, 页码: 3103-3114
作者:  Ouyang, Chaojun;  Li, Zhenhuan;  Huang, Minsheng;  Fan, Haidong
收藏  |  浏览/下载：109/0  |  提交时间：2013/07/05
Stresses in a multilayer thin film/substrate system subjected to nonuniform temperature 期刊论文
2010, 2010
Feng, X.; Huang, Y.; Rosakis, A. J.
收藏  |  浏览/下载：1/0
Determination Ofinterfacial Mechanical Parameters For An Al/Epoxy/Al2O3 System Byusing Peel Test Simulations 期刊论文
Acta Mechanica Solida Sinica, 2008, 页码: 198-206
作者:  You XM(尤雪梅);  Zhao HF(赵海峰);  Wei YG(魏悦广)
收藏  |  浏览/下载：651/88  |  提交时间：2009/08/03
Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L.
收藏  |  浏览/下载：18/0  |  提交时间：2013/03/25
Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer  for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS  an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively  valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed  acceleration and viscosity of the photoresist. After development  the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate  the film thickness error was within 1%  and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater  which contributes to quality improvement of laser direct writing lines on CSS.  
Key techniques of laser direct writing patterns on spherical substrate (EI CONFERENCE) 会议论文
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China
Feng X.-G.; Zhao J.-L.
收藏  |  浏览/下载：15/0  |  提交时间：2013/03/25
Comparing with the writing method of plane pattern  spherical pattern' has some remarkable different on several points. Firstly  it is difficult to spin-coated a uniform photoresist film on a spherical substrate  especially the ratio of spherical radius to caliber is smaller  and the spin-coated way must match the ratio of spherical radius to caliber. Secondly  if the sphere couldn't be regarded as a plane  a so-called concentric optical scan movement way must be applied for the generation of spherical pattern  because the reflex of substrate will affect the quantity of illumination. Commonly  an alignment technique is indispensable with pattern generation of spherical surface by the concentric optical scan in order to ensure the orthogonal intersection of focusing laser beam and writing surface. Thirdly  a uniform velocity control must be considered for the laser direct writing method on a spherical substrate. Otherwise  the exposure time of photoresist will be different  and the line widths of pattern will be also different at different areas. Fourthly  commonly  because the errors of concentric machine and substrate surface shape are bigger  so focusing servo-control technique is also needful for writing a pattern on a spherical substrate. Focusing servo-control may keep the focal spot on the spherical surface by a focus detection and control system in the course of writing pattern. Using these techniques  we fabricated a line width of 7m and a period of 600m isometric mesh on the concave of a spherical substrate.  
Small scale, grain size and substrate effects in nano-indentation experiment of film-substrate systems 期刊论文
International Journal of Solids and Structures, 2007, 卷号: 44, 期号: 13, 页码: 4492-4504
作者:  Chen SH(陈少华);  Liu L(刘磊);  Wang ZQ(王自强)
收藏  |  浏览/下载：905/46  |  提交时间：2009/08/03

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