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Read Static Noise Margin Decrease of 65-nm 6-T SRAM Cell Induced by Total Ionizing Dose 期刊论文
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2018, 卷号: 65, 期号: 2, 页码: 691-697
作者:  Zheng, QW (Zheng, Qiwen);  Cui, JW (Cui, Jiangwei);  Yu, XF (Yu, Xuefeng);  Lu, W (Lu, Wu);  He, CF (He, Chengfa)
收藏  |  浏览/下载:49/0  |  提交时间:2018/05/15
Direct measurement and analysis of total ionizing dose effect on 130 nm PD SOI SRAM cell static noise margin 期刊论文
CHINESE PHYSICS B, 2017, 卷号: 26, 期号: 9, 页码: 1-5
作者:  Zheng, QW (Zheng, Qiwen);  Cui, JW (Cui, Jiangwei);  Liu, MX (Liu, Mengxin);  Su, DD (Su, Dandan);  Zhou, H (Zhou, Hang)
收藏  |  浏览/下载:39/0  |  提交时间:2017/12/05
基于SOI工艺抗辐照嵌入式SRAM关键技术研究 学位论文
工学博士, 中国科学院自动化研究所: 中国科学院大学, 2015
作者:  刘丽
收藏  |  浏览/下载:214/0  |  提交时间:2015/09/02
Pattern imprinting in deep sub-micron static random access memories induced by total dose irradiation 期刊论文
Chinese Physics B, 2014, 卷号: 23, 期号: 10
作者:  Zheng, Qi-Wen;  Yu, Xue-Feng;  Cui, Jiang-Wei;  Guo, Qi;  Ren, Di-Yuan
收藏  |  浏览/下载:22/0  |  提交时间:2014/11/11
Numerical study on effect of random dopant fluctuation on double gate MOSFET based 6-T SRAM performance 其他
2011-01-01
Zhang, Xiufang; Ma, Chenyue; Zhao, Wei; Zhang, Chenfei; Wang, Guozeng; Wu, Wen; Wang, Wenping; Cao, Yu; Yang, Shengqi; Yang, Zhang; Ma, Yong; Ye, Yun; Li, Yongliang; Wang, Ruonan; Wang, Ruonan; He, Jin
收藏  |  浏览/下载:6/0  |  提交时间:2015/11/13
Impact of Stochastic Mismatch on FinFETs SRAM Cell Induced by Process Variation 其他
2008-01-01
Yu, Shimeng; Zhao, Yuning; Du, Gang; Kang, Jinfeng; Han, Ruqi; Liu, Xiaoyan
收藏  |  浏览/下载:9/0  |  提交时间:2015/11/10
A Novel 4T nMOS-Only SRAM Cell in 32nm Technology Node 期刊论文
半导体学报, 2008, 卷号: 29, 期号: 10, 页码: 1917-1921
Zhang Wancheng; Wu Nanjian
收藏  |  浏览/下载:17/0  |  提交时间:2010/11/23
Impacts of Process Variability of Alternating-Material Self-Aligned Multiple Patterning on SRAM Circuit Performance (CPCI-S收录) 会议
作者:  Han, Ting[1];  Hong, Chuyang[1];  Cheng, Qi[1];  Chen, Yijian[1]
收藏  |  浏览/下载:3/0  |  提交时间:2019/04/11
SRAM Circuit Performance in the Presence of Process Variability of Self-aligned Multiple Patterning (CPCI-S收录) 会议论文
DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION VII
作者:  Xiao, Wei[1];  Cheng, Qi[1];  Chen, Yijian[1]
收藏  |  浏览/下载:6/0  |  提交时间:2019/04/15


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