×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
长春光学精密机械与物... [1]
内容类型
会议论文 [1]
发表日期
2006 [1]
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共1条,第1-1条
帮助
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
Key techniques of laser direct writing of fine lines on the spherical surface (EI CONFERENCE)
会议论文
ICO20: Optical Design and Fabrication, August 21, 2005 - August 26, 2005, Changchun, China
Liang F.
;
Hu J.
收藏
  |  
浏览/下载:15/0
  |  
提交时间:2013/03/25
The main principles of laser direct writing (LDW) system for lines on the spherical surface (SS) are discussed. It is pointed out that line profile is determined by the exposure dose distribution
which lies on the light intensity distribution of focus plane and the scanning speed. To improve the quality of line profile on the SS
several key techniques as follows are introduced. Firstly
the unique system configuration
four axes mutually intersecting at the center of the SS
is adopted
which ensures the shape of the focus be maintained circular during the writing period. Secondly
an automatic focus system (AFS) with the function of automatic focus in a certain range is introduced. Thirdly
to guarantee the linear velocity to accord with the exposure character of the photoresist all the time
an efficient arithmetic that controls motors run at appropriate angular velocity in different latitude is developed. Finally
to achieve a stable and well-behaved system so as to compensate the velocity instability resulting from unavoidable errors of mechanical and electronics factor
a powerful programmable multi-axis controller (PMAC) is utilized as the kernel element of the servocontrol system
and the curves of step response and parabolic response achieved by feedforward and PID loop tuning indicate that the location precision and velocity stability have reached a high level. The experimental results of LDW of lines on the SS work piece with a diameter 30 mm and a radius equal to 100 mm are given. The section analysis of the lines on the photoresist by the atomic force microscope (AFM) after exposure and development is performed. The results show that line width is about 3.0 m
and the steep sides of the lines are parallel to each other.
©版权所有 ©2017 CSpace - Powered by
CSpace