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Annealing-induced evolution in interface stability and electrical performance of sputtering-driven rare-earth-based gate oxides 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 778, 期号: 无, 页码: 579-587
作者:  Wang, Die;  He, Gang;  Liang, Shuang;  Liu, Mao
收藏  |  浏览/下载：56/0  |  提交时间：2020/03/31
Electrochemical characterization of anodic oxide film on TC11 alloy in sulfate solution at high temperature and high pressure 期刊论文
International Journal of Electrochemical Science, 2019, 卷号: 14, 期号: 5, 页码: 4546-4556
作者:  Lei Zha;  Heping Li;  Ning Wang
收藏  |  浏览/下载：11/0  |  提交时间：2020/09/21
Preparation and Characterization of Carbon-encapsulated Cobalt () Oxide Nanoparticles 期刊论文
Cailiao Daobao/Materials Review, 2018, 卷号: 32, 期号: 2, 页码: 621-625
作者:  Zhu, Xueliang;  Wei, Zhiqiang;  Bai, Junshan;  Zhao, Wenhua;  Feng, Wangjun
收藏  |  浏览/下载：2/0  |  提交时间：2020/11/14
The total ionizing dose effect on SiO2 and new high-k gate dielectrics under gamma-ray irradiation 会议论文
作者:  Ding, Man;  Cheng, Yonghong
收藏  |  浏览/下载：13/0  |  提交时间：2019/11/19
Interface Engineering of Ge-based Nanoelectronics Using Fluorinated Graphene 会议论文
2018 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2018 - Proceedings
作者:  Zheng, X.;  Zhang, M.;  Shi, X.;  Wang, G.;  Zheng, L.
收藏  |  浏览/下载：8/0  |  提交时间：2019/12/30
Preparation and characterization of carbon-encapsulated NiO nano particles 期刊论文
Fuhe Cailiao Xuebao/Acta Materiae Compositae Sinica, 2017, 卷号: 34, 期号: 11, 页码: 2494-2499
作者:  Xie, Zhu;  Wei, Zhiqiang;  Bai, Junshan;  Zhu, Xueliang;  Feng, Wangjun
收藏  |  浏览/下载：4/0  |  提交时间：2020/11/14
Atomic-Layer-Deposition Growth of an Ultrathin HfO2 Film on Graphene 期刊论文
ACS APPLIED MATERIALS & INTERFACES, 2017
Xiao, Mengmeng; Qiu, Chenguang; Zhang, Zhiyong; Peng, Lian-Mao
收藏  |  浏览/下载：3/0  |  提交时间：2017/12/03
Accurate lifetime prediction for channel hot carrier stress on sub-1 nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer 期刊论文
Microelectronics Reliability, 2016
作者:  Luo WC(罗维春);  Yang H(杨红);  Wang WW(王文武);  Zhu HL(朱慧珑);  Zhao C(赵超)
收藏  |  浏览/下载：14/0  |  提交时间：2017/05/09
Understanding the role of TiN barrier layer on electrical performance of MOS device with ALD-TiN/ALD-TiAlC metal gate stacks 期刊论文
ECS Journal of Solid State Science and Technology, 2016
作者:  Xiang JJ(项金娟);  Li TT(李亭亭);  Wang XL(王晓磊);  Han K(韩锴);  Li JF(李俊峰)
收藏  |  浏览/下载：10/0  |  提交时间：2017/05/09
Interfacial and electrical properties of HfAlO/GaSb metal-oxide-semiconductor capacitors with sulfur passivation 期刊论文
2016, 2016
谭桢; 赵连锋; 王敬; 许军; Tan Zhen; Zhao Lian-Feng; Wang Jing; Xu Jun
收藏  |  浏览/下载：8/0

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