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长春光学精密机械与物... [1]
光电技术研究所 [1]
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会议论文 [2]
发表日期
2012 [2]
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Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm (EI CONFERENCE)
会议论文
2012 12th IEEE International Conference on Nanotechnology, NANO 2012, August 20, 2012 - August 23, 2012, Birmingham, United kingdom
Li S.
;
Shi L.
;
Yang Z.
;
Huang X.
;
Zhang Z.
;
Gao F.
;
Guo Y.
;
Yu W.
;
Du J.
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提交时间:2013/03/25
A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express
Vol. 16
No. 19 (2008) 14397]. Following that
to break the limitations in resolution and PSs period of NSSL method
in this paper
we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method
contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example
the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results
we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. 2012 IEEE.
Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm
会议论文
2012 12th IEEE International Conference on Nanotechnology, NANO 2012, 2012
作者:
Li, Shuhong
;
Shi, Lifang
;
Yang, Zheng
;
Huang, Xia
;
Zhang, Zhiyou
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提交时间:2016/11/24
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