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Influence of N-2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering 期刊论文
THIN SOLID FILMS, 2010, 卷号: 518, 页码: 2077-2081
作者:  Ding, Wanyu;  Xu, Jun;  Lu, Wenqi;  Deng, Xinlu;  Dong, Chuang
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Deposition of silicon carbon nitride thin films by microwave ECR plasma enhanced unbalance magnetron sputtering 期刊论文
5th Asian/European International Conference on Plasma Surface Engineering, 2007, 卷号: 201, 页码: 5298-5301
作者:  
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Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering 期刊论文
PLASMA SCIENCE & TECHNOLOGY, 2006, 卷号: 8, 页码: 425-428
作者:  
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Development of NiCr/NiSi thin-film thermocouple sensor for workpiece temperature measurement in chemical explosive material machining 期刊论文
JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME, 2006, 卷号: 128, 页码: 175-179
作者:  
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Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering 期刊论文
材料热处理学报, 2004, 卷号: 25, 页码: 818-820
作者:  
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Plasma source ion implantation (PSII) and PSII enhanced film deposition 期刊论文
Chinese Physics Letters, 1993, 卷号: 10, 页码: 355
作者:  
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