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| Effect of ion bombardment time on the profile of atomic layer etching 会议论文 2nd Asia-Pacific Conference on Plasma Physics 作者: Dai ZL(戴忠玲); Dong W(董婉); Song YH(宋远红); Wang YN(王友年) 收藏  |  浏览/下载:12/0  |  提交时间:2019/12/02 |
| ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams 会议论文 7th international conference on microelectronics and plasma technology 作者: Dong W(董婉) 收藏  |  浏览/下载:11/0  |  提交时间:2019/12/02 |
| Effect of plasma uniformity on etching profiles 会议论文 The 71st Annual Gaseous Electronics Conference 作者: 收藏  |  浏览/下载:6/0  |  提交时间:2019/12/02 |
| Numerical study of atomic layer precision control for SiO2 etching 会议论文 the 70th Annual Gaseous Electronics Conference, November 6-10, 2017, in Pittsburgh, PA, U.S.A. 作者: 收藏  |  浏览/下载:2/0  |  提交时间:2019/12/02 |
| Accuracy control of SiO2 etching in inductively coupled CF4/Ar plasmas 会议论文 1st Asia-Pacific Conference on Plasma Physics, 18-23, 09.2017 作者: 收藏  |  浏览/下载:3/0  |  提交时间:2019/12/02 |
| Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias waveforms 期刊论文 Plasma Sci. Technol., 2017, 卷号: 19, 页码: 85502-85502 作者: 收藏  |  浏览/下载:2/0  |  提交时间:2019/12/03 |
| Simulation of atomic layer etching of Si in inductively coupled argon/chlorine plasmas with tailored bias voltage waveforms 会议论文 The 6th International Conference on Microelectronics and Plasma Technology (ICMAP 2016) 作者: 收藏  |  浏览/下载:7/0  |  提交时间:2019/12/09 |
| Atomic layer etching of SiO2 under Ar/C4F8 plasmas with pulsed bias 会议论文 The joint 68th Gaseous Electronics Conference, the 9th International Conference on Reactive Plasmas, and the 33rd Symposium on Plasma Processing (GEC-68/ICRP-9/SPP-33) 作者: 收藏  |  浏览/下载:1/0  |  提交时间:2019/12/09 |
| Atomic Layer Etching of Silicon and Silicon Dioxide Under Pulsed RF Substrate Bias 会议论文 ICMAP 2014: International Conference of Microelectronics and Plasma Technology 作者: 收藏  |  浏览/下载:3/0  |  提交时间:2019/12/11 |
| Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequency source 会议论文 The 3rd International Conference of Microelectronics and Plasma Technology 作者: 收藏  |  浏览/下载:1/0  |  提交时间:2019/12/18 |