CORC

浏览/检索结果: 共2条,第1-2条 帮助

限定条件    
已选(0)清除 条数/页:   排序方式:
Low-cost and highly manufacturable strained-Si channel technique for strong hole mobility enhancement on 35-nm gate length pMOSFETs 外文期刊
2007
作者:  Xu, QX;  Duan, XF;  Liu, HH;  Han, ZS;  Ye, TC
收藏  |  浏览/下载:7/0  |  提交时间:2010/11/26
Hole mobility enhancement of pMOSFETs with strain channel induced by ge pre-amorphization implantation for source/drain extension 外文期刊
2006
作者:  Xu, QX;  Duan, XF;  Qian, H;  Liu, HH;  Li, HO
收藏  |  浏览/下载:12/0  |  提交时间:2010/11/26


©版权所有 ©2017 CSpace - Powered by CSpace