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| HfO2–GaAs metal-oxide-semiconductor capacitor using dimethylaluminumhydride-derived aluminum oxynitride interfacial passivation layer 期刊论文
APPLIED PHYSICS LETTERS, 2010
G. He + L. D. Zhang+ M. Liu+Z. Q. Sun
  收藏 | 浏览/下载：11/0 | 提交时间：2011/12/14 |
| hfO2-GaAs metal-oxide-semiconductor capacitor using dimethylaluminumhydride-deived aluminum oxynitride interfacial passivation layer 期刊论文
applied physics letters, 2010
G. He; L. D. Zhang; M. Liu; Z. Q. Sun
收藏 | 浏览/下载：7/0 | 提交时间：2012/05/04 |
| Structural, optical properties and band gap alignments of ZrOxNy thin films on Si (1 0 0) by radio frequency sputtering at different deposition temperatures 期刊论文
applied surface science, 2008, 期号: 254
L.Q. Zhu; Q. Fang; X.J. Wang; J.P. Zhang; M. Liu; G.He; L.D. Zhang
收藏 | 浏览/下载：18/0 | 提交时间：2010/07/14 |
| Characteristics of HfOxNy thin films by rf reactive sputtering at different deposition temperatures 期刊论文
journal of applied physics, 2007, 期号: 101
M. Liu; Q. Fang; G. He; L. Q. Zhu; L. D. Zhang
收藏 | 浏览/下载：11/0 | 提交时间：2010/07/15 |
| Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films 期刊论文
applied surface science, 2007, 期号: 253
G. He; L.Q. Zhu; M. Liu; Q. Fang
收藏 | 浏览/下载：8/0 | 提交时间：2010/07/15 |
| Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reactive sputtering 期刊论文
applied surface science, 2007, 期号: 253
G. He; Q. Fang; G.H. Li; J.P. Zhang; L.D. Zhang
收藏 | 浏览/下载：9/0 | 提交时间：2010/07/16 |
| Thermal stability and energy-band alignment of nitrogen-incorporated ZrO2 films on Si(100) 期刊论文
applied physics letters, 2006, 期号: 88
L. Q. Zhu; L. D. Zhang; G. H. Li; G. He
收藏 | 浏览/下载：20/0 | 提交时间：2010/08/16 |
| Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy 期刊论文
journal of applied physics, 2006, 期号: 100
G. He; L. D. Zhang; Q. Fang
收藏 | 浏览/下载：15/0 | 提交时间：2010/07/23 |
| Microstructure and interfacial properties of HfO2–Al2O3 nanolaminate films 期刊论文
Applied Surface Science, 2006, 期号: 252
M. Liu; G. He; L.Q. Zhu; Q. Fang; G.H. Li; L.D. Zhang
收藏 | 浏览/下载：22/0 | 提交时间：2010/07/21 |
| Spectroscopic ellipsometry characterization of ZrO2 thin films by nitrogen-assisted reactive magnetron sputtering 期刊论文
materials science in semiconductor processing, 2006, 期号: 9
L.Q. Zhu; Q. Fang; G. He; M. Liu; X.X. Xu; L.D. Zhang
收藏 | 浏览/下载：17/0 | 提交时间：2010/07/23 |
