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Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs 期刊论文
Solid-State Electronics, 2015
作者:  Li JF(李俊峰);  Wang GL(王桂磊);  Xu YF(徐烨峰);  Luo J(罗军);  Guo YL(郭奕栾)
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