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| Thermal stability and energy-band alignment of nitrogen-incorporated ZrO2 films on Si(100) 期刊论文 applied physics letters, 2006, 期号: 88 L. Q. Zhu; L. D. Zhang; G. H. Li; G. He
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:20/0  |  提交时间:2010/08/16 |
| Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy 期刊论文 journal of applied physics, 2006, 期号: 100 G. He; L. D. Zhang; Q. Fang
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:15/0  |  提交时间:2010/07/23 |
| Microstructure and interfacial properties of HfO2–Al2O3 nanolaminate films 期刊论文 Applied Surface Science, 2006, 期号: 252 M. Liu; G. He; L.Q. Zhu; Q. Fang; G.H. Li; L.D. Zhang
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:22/0  |  提交时间:2010/07/21 |
| Spectroscopic ellipsometry characterization of ZrO2 thin films by nitrogen-assisted reactive magnetron sputtering 期刊论文 materials science in semiconductor processing, 2006, 期号: 9 L.Q. Zhu; Q. Fang; G. He; M. Liu; X.X. Xu; L.D. Zhang
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:17/0  |  提交时间:2010/07/23 |
| Effect of post deposition annealing on the optical properties of HfOxNy films 期刊论文 applied physics letters, 2006, 期号: 88 M. Liu; Q. Fang; G. He; L. Li; L. Q. Zhu; G. H. Li; L. D. Zhang
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:21/0  |  提交时间:2010/07/20 |
| Characterization of HfOxNy gate dielectrics using a hafnium oxide as target 期刊论文 applied surface science, 2006, 期号: 252 M. Liu; Q. Fang; G. He; L.Q. Zhu; L.D. Zhang
![](/themes/default/image/downing1.png) 收藏  |  浏览/下载:19/0  |  提交时间:2010/07/20 |