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会议论文 [7]
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Eigenfrequency loci crossings, veerings and mode splittings of overhanged cantilevers
会议论文
Montreal, QC, Canada, July 7, 2019 - July 11, 2019
作者:
Liu Y
;
Zhang Y(张吟)
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  |  
浏览/下载:14/0
  |  
提交时间:2020/11/20
Crossing
Eigenfrequency
Mode splitting
Veering
INFLUENCE OF BEARING CONFIGURATION ON SPINDLE MODAL CHARACTERISTICS
会议论文
作者:
Hong, Jun
;
Liu, Guanghui
;
Li, Xiaohu
;
Wu, Wenwu
;
Wan, Shaoke
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  |  
浏览/下载:11/0
  |  
提交时间:2019/12/02
Natural Frequency
Bearing Configuration
Coupling FE Model
Span
Overhang
Improvement of active lap processing in grinding of 1.8m primary mirror
会议论文
Proceedings of SPIE: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2014
作者:
Liu, Haitao
;
Wu, Fan
;
Zeng, Zhige
;
Fan, Bin
;
Wan, Yongjian
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  |  
浏览/下载:15/0
  |  
提交时间:2016/11/24
Renew and extension of vigor in historical block- The background study of historical block and the building overhang protection and synthesis reform in Haikou
会议论文
2011 International Conference on Civil Engineering and Transportation, ICCET 2011, October 14, 2011 - October 16, 2011
作者:
Yi, Yang
;
Yi, Xiong
;
Yiran, Shen
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  |  
浏览/下载:6/0
  |  
提交时间:2019/12/31
A novel method for fabrication of integrated shadow mask for patterning electrode in passive matrix OLED displays (EI CONFERENCE)
会议论文
6th Electronics Packaging Technology Conference, EPTC 2004, December 8, 2005 - December 10, 2005, Singapore, Singapore
Huang Z. H.
;
Su W. M.
;
Qi G. J.
;
Lu H. J.
;
Zeng X. T.
;
Wong S.
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  |  
浏览/下载:24/0
  |  
提交时间:2013/03/25
This paper reports a novel method for making an integrated shadow mask used in fabrication of passive matrix OLED displays. Common positive and negative photoresists were employed to produce retrograded strip pillars with large overhang and undercut by photolithography. The pillar strips serve as an effective shadow mask for patterning the organic layers and the metal cathodes in OLED display devices. It is expected that this method can significantly enhance the performance of passive matrix OLED at a low shadow mask fabrication cost. The method can be used for fabricating more complicated structures for other display applications. 2004 IEEE.
地理信息系统支持下的计算机滑坡三维仿真
会议论文
海峡两岸山地灾害与环境保护学术讨论会, 四川成都, 1998-09
作者:
李先华
;
管群
;
乔建平
;
谭万沛
;
杨武年
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  |  
浏览/下载:13/0
  |  
提交时间:2010/10/25
GIS
滑坡
三维数字仿真
Cut-Process Overlay Yield Model for Self-aligned Multiple Patterning and a Misalignment Correction Technique Based on Dry Etching (CPCI-S收录)
会议论文
ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II
作者:
Zhang, Pan[1]
;
Chen, Yijian[1]
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  |  
浏览/下载:1/0
  |  
提交时间:2019/04/15
self-aligned multiple patterning (SAMP)
cut process
overlay error
yield
overhang
dry etching
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