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Direct Regulation of O/W Stoichiometric Ratio and Microstructure in Tungsten Oxide Electrochromic Films by Ar Pressure Using Oxide Target Sputtering 期刊论文
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2020, 卷号: 217, 期号: 8
作者:  Zhao, Wenkai;  Zhao, Yue;  Yang, Ye;  Li, Jia;  Lan, Pinjun
收藏  |  浏览/下载：11/0  |  提交时间：2020/12/16
Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers 期刊论文
THIN SOLID FILMS, 2004, 卷号: 459, 期号: 1-2, 页码: 63-66
Li,WJ; Song,ZR; Tao,K; Cheng,XH; Yang,WW; Yu,YH; Wang,X; Zou,SC; Shen,DS
收藏  |  浏览/下载：11/0  |  提交时间：2012/03/24

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