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浏览/检索结果: 共5条，第1-5条 帮助 限定条件 学科主题：光学     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image 期刊论文 applied optics, 2010, 卷号: 49, 期号: 15, 页码: 2753-2760 Peng B(彭勃); Wang XZ(王向朝); Qiu ZC(邱自成); Cao YT(曹宇婷); Duan LF(段立峰) 收藏  |  浏览/下载：20/0  |  提交时间：2011/03/31 Aberration induced intensity imbalance of alternating phase shifting mask in lithographic imaging 期刊论文 optics letters, 2010, 卷号: 35, 期号: 9, 页码: 1404-1406 Peng B(彭勃); Wang XZ(王向朝); Qiu ZC(邱自成); Yuan QY(袁琼雁); Cao YT(曹宇婷) 收藏  |  浏览/下载：26/0  |  提交时间：2011/03/31 Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width 期刊论文 applied optics, 2009, 卷号: 48, 期号: 19 Zicheng Qiu; Xiangzhao Wang; Qiongyan Yuan; and Fan Wang 收藏  |  浏览/下载：750/120  |  提交时间：2010/04/26 Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations 期刊论文 applied optics, 2009, 卷号: 48, 期号: 19 Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan 收藏  |  浏览/下载：848/150  |  提交时间：2010/04/26 Even aberration measurement of lithographic projection system based on optimized phase-shifting marks 期刊论文 microelectronic engineering, 2009, 卷号: 86, 期号: 1 Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu; Fan Wang; Mingying Ma 收藏  |  浏览/下载：809/158  |  提交时间：2010/04/26