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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering 期刊论文
Materials Science and Engineering B, 2011, 卷号: 176, 页码: 850-854
作者:  Ji L(吉利);  Li HX(李红轩);  Li HX(李红轩);  Zhou HD(周惠娣);  Chen JM(陈建敏)
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