Femtosecond Photoelectron Imaging of N-2 at 410 nm
Guo, Wei1; Wei, Shanshan1; Lu, Xingqiang2; Wang, Li3
刊名bulletin of the korean chemical society
2010-12-20
卷号31期号:12页码:3693-3696
关键词Two-step model Rydberg states Ponderomotive potential Resonant/nonresonant population transfer
英文摘要we experimentally measure the kinetic energy and angular distributions of photoelectrons of n-2 as a function of 410 nm femtosecond laser intensity by using velocity map imaging technique. the strong-field multiphoton ionization of molecules shares many of the characteristics with those of atoms. electron kinetic energies are nearly independent of laser intensities. the independence suggests that the electron peaks in the photoelectron spectrum actually result from a two-step process, indicative of the occurrence of real population in the intermediate states. the relative amplitudes of electron peaks indicate that in the two-step process, nonresonant population transfer dominates for low intensities, while resonant population transfer dominates for higher intensities.
WOS标题词science & technology ; physical sciences
类目[WOS]chemistry, multidisciplinary
研究领域[WOS]chemistry
关键词[WOS]pulse multiphoton ionization ; above-threshold ionization ; dynamics ; electrons ; fields ; states ; xenon ; argon
收录类别SCI
语种英语
WOS记录号WOS:000286150900037
公开日期2015-11-17
内容类型期刊论文
源URL[http://159.226.238.44/handle/321008/141918]  
专题大连化学物理研究所_中国科学院大连化学物理研究所
作者单位1.Univ S China, Sch Elect Engn, Hengyang 421001, Peoples R China
2.Univ S China, Sch Nucl Sci & Technol, Hengyang 421001, Peoples R China
3.Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
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GB/T 7714
Guo, Wei,Wei, Shanshan,Lu, Xingqiang,et al. Femtosecond Photoelectron Imaging of N-2 at 410 nm[J]. bulletin of the korean chemical society,2010,31(12):3693-3696.
APA Guo, Wei,Wei, Shanshan,Lu, Xingqiang,&Wang, Li.(2010).Femtosecond Photoelectron Imaging of N-2 at 410 nm.bulletin of the korean chemical society,31(12),3693-3696.
MLA Guo, Wei,et al."Femtosecond Photoelectron Imaging of N-2 at 410 nm".bulletin of the korean chemical society 31.12(2010):3693-3696.
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