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	Maskless lithography illumination system with double freeform surfaces for beam shaping
	Meng X. ; Liu W. ; Wei Z. ; Liu H. ; Kang Y. ; Feng R. ; Zhang D.
刊名	Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering
	2014
卷号	43期号:5页码:1505-1510
ISSN号	ISBN/10072276
英文摘要	In order to achieve the illumination of maskless lithography by rectangular collimated flat-top laser beam and improve the illumination efficiency, a design method of the illumination system using double freeform surfaces shaping unit was proposed. Based on the optical path constant condition and Snell's refraction law, the surfaces equations in integral form of the freeform surfaces were derived. The integral equations were solved by numerical calculation. The illumination systems using two-lens shaping unit and single-lens shaping unit which included double freeform surfaces were designed and simulated by optical design software. The simulated results show that the uniformity is over 93% and the illumination efficiency is over 91%. It is illustrated that the two kinds of shaping unit could meet the requirements of the illumination of maskless lithography.
收录类别	EI
语种	中文
公开日期	2015-05-27
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/44141]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Meng X.,Liu W.,Wei Z.,et al. Maskless lithography illumination system with double freeform surfaces for beam shaping[J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,2014,43(5):1505-1510.
APA	Meng X..,Liu W..,Wei Z..,Liu H..,Kang Y..,...&Zhang D..(2014).Maskless lithography illumination system with double freeform surfaces for beam shaping.Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,43(5),1505-1510.
MLA	Meng X.,et al."Maskless lithography illumination system with double freeform surfaces for beam shaping".Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering 43.5(2014):1505-1510.

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