General fabrication of ordered nanocone arrays by one-step selective plasma etching

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	General fabrication of ordered nanocone arrays by one-step selective plasma etching
	Wang, Q ; Tian, ZS ; Li, YL ; Tian, SB ; Li, YM ; Ren, ST ; Gu, CZ ; Li, JJ
刊名	NANOTECHNOLOGY
	2014
卷号	25 期号:11
关键词	general cones formation one-step selective plasma etching methylic CH3+ ions nano-masking
ISSN号	0957-4484
通讯作者	Wang, Q (reprint author), Harbin Inst Technol Wei Hai, Coll Sci, Dept Opt & Elect Sci, Wei Hai 264209, Peoples R China.
中文摘要	One-step selective direct current (DC) plasma etching technology is employed to fabricate large-area well-aligned nanocone arrays on various functional materials including semiconductor, insulator and metal. The cones have nanoscale apexes (similar to 2 nm) with high aspect ratios, which were achieved by a selective plasma etching process using only CH4 and H-2 in a bias-assisted hot filament chemical vapor deposition (HFCVD) system without any masked process. The CH3+ ions play a major role to etch the roughened surface into a conical structure under the auxiliary of H+ ions. Randomly formed nano-carbon may act as an original mask on the smooth surface to initiate the following selective ions sputtering. Physical impinging of energetic ions onto the concave regions is predominant in comparison with the etching of convex parts on the surface, which is identified as the key mechanism for the formation of conical nanostructures. This one-step maskless plasma etching technology enables the universal formation of uniform nanocone structures on versatile substrates for many promising applications.
资助信息	National Natural Science Foundation of China (NSFC) [11274082, 91023041, 11174362, 91323304, 51272278, 61390503]; Shandong Excellent Young Scientist Research Award Fund Project [BS2011CL002]; Fundamental Research Funds for the Central Universities [HIT. BRET. 2010014]; Knowledge Innovation Project of CAS [KJCX2EWW02]
语种	英语
公开日期	2015-04-14
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/59372]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Wang, Q,Tian, ZS,Li, YL,et al. General fabrication of ordered nanocone arrays by one-step selective plasma etching[J]. NANOTECHNOLOGY,2014,25(11).
APA	Wang, Q.,Tian, ZS.,Li, YL.,Tian, SB.,Li, YM.,...&Li, JJ.(2014).General fabrication of ordered nanocone arrays by one-step selective plasma etching.NANOTECHNOLOGY,25(11).
MLA	Wang, Q,et al."General fabrication of ordered nanocone arrays by one-step selective plasma etching".NANOTECHNOLOGY 25.11(2014).