Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth

	Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth
	Li, Guoxing ; Li, Shanwen ; Li, Wei ; Wang, Xinsheng ; Guo, Feng ; Zhang, Baolin ; Chou, PenChu
刊名	physica c-superconductivity and its applications
	2014
卷号	507 页码:17-21
学科主题	半导体器件
收录类别	SCI
语种	英语
公开日期	2015-01-29
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/25946]
专题	半导体研究所_光电子器件国家工程中心
推荐引用方式 GB/T 7714	Li, Guoxing,Li, Shanwen,Li, Wei,et al. Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth[J]. physica c-superconductivity and its applications,2014,507:17-21.
APA	Li, Guoxing.,Li, Shanwen.,Li, Wei.,Wang, Xinsheng.,Guo, Feng.,...&Chou, PenChu.(2014).Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth.physica c-superconductivity and its applications,507,17-21.
MLA	Li, Guoxing,et al."Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth".physica c-superconductivity and its applications 507(2014):17-21.