Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering

	Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering
	Li K(李魁) ; Dong XL(董显林) ; 99 ; Lei XY(雷秀云) ; Li T(李涛) ; Du G(杜刚) ; Wang GS(王根水)
刊名	Appl. Phys. Lett
	2013-12-31
卷号	96 期号:6 页码:1682
ISSN号	0003-6951
其他题名	Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering
通讯作者	王根水
学科主题	无机非金属材料
语种	英语
WOS记录号	WOS:000320036600002
公开日期	2014-12-18
内容类型	期刊论文
源URL	[http://ir.sic.ac.cn/handle/331005/4964]
专题	上海硅酸盐研究所_无机功能材料与器件重点实验室_期刊论文
推荐引用方式 GB/T 7714	Li K,Dong XL,99,et al. Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering[J]. Appl. Phys. Lett,2013,96(6):1682.
APA	Li K.,Dong XL.,99.,Lei XY.,Li T.,...&Wang GS.(2013).Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering.Appl. Phys. Lett,96(6),1682.
MLA	Li K,et al."Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering".Appl. Phys. Lett 96.6(2013):1682.