Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm

	Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm
	Guanghui Liu ; Ming Zhou ; Guohang Hu ; Xiaofeng Liu ; Yunxia Jin ; Hongbo He ; Zhengxiu Fan
刊名	applied surface science
	2010
期号	256
合作状况	其它
学科主题	光学材料
收录类别	其他
语种	中文
WOS记录号	WOS:000276492300027
公开日期	2011-04-21
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/7243]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Guanghui Liu,Ming Zhou,Guohang Hu,et al. Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm[J]. applied surface science,2010(256).
APA	Guanghui Liu.,Ming Zhou.,Guohang Hu.,Xiaofeng Liu.,Yunxia Jin.,...&Zhengxiu Fan.(2010).Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm.applied surface science(256).
MLA	Guanghui Liu,et al."Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm".applied surface science .256(2010).