Characteristics of nodular defect in HfO2/SiO2 multilayer optical coatings

	Characteristics of nodular defect in HfO2/SiO2 multilayer optical coatings
	Xiaofeng Liu ; Dawei Li ; Yuan’an Zhao ; Xiao Li ; Jianda Shao
刊名	applied surface science
	2010
期号	1 页码:3783
合作状况	其它
学科主题	激光技术
收录类别	其他
语种	中文
WOS记录号	WOS:000275234000014
公开日期	2011-04-12
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/7185]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Xiaofeng Liu,Dawei Li,Yuan’an Zhao,et al. Characteristics of nodular defect in HfO2/SiO2 multilayer optical coatings[J]. applied surface science,2010(1):3783.
APA	Xiaofeng Liu,Dawei Li,Yuan’an Zhao,Xiao Li,&Jianda Shao.(2010).Characteristics of nodular defect in HfO2/SiO2 multilayer optical coatings.applied surface science(1),3783.
MLA	Xiaofeng Liu,et al."Characteristics of nodular defect in HfO2/SiO2 multilayer optical coatings".applied surface science .1(2010):3783.