Study on improving the compactness of SiO2 thin film by PECVD

	Study on improving the compactness of SiO2 thin film by PECVD
	GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning
刊名	journal of synthetic crystals
	2013
卷号	42 期号:4 页码:577-581
学科主题	光电子学
收录类别	EI
语种	英语
公开日期	2014-04-28
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/24830]
专题	半导体研究所_集成光电子学国家重点实验室
推荐引用方式 GB/T 7714	GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning. Study on improving the compactness of SiO2 thin film by PECVD[J]. journal of synthetic crystals,2013,42(4):577-581.
APA	GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning.(2013).Study on improving the compactness of SiO2 thin film by PECVD.journal of synthetic crystals,42(4),577-581.
MLA	GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning."Study on improving the compactness of SiO2 thin film by PECVD".journal of synthetic crystals 42.4(2013):577-581.