Reactive sputter deposition of carbon nitride films by using hollow-cathode discharge

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	Reactive sputter deposition of carbon nitride films by using hollow-cathode discharge
	Zhao, J ; Kang, N ; Xu, JR
刊名	CHINESE PHYSICS LETTERS
	1996
卷号	13 期号:4 页码:305
关键词	AMORPHOUS-CARBON
ISSN号	0256-307X
通讯作者	Zhao, J (reprint author), CHINESE ACAD SCI,INST PHYS,POB 603,BEIJING 100080,PEOPLES R CHINA.
中文摘要	Carbon nitride films have been prepared by reactive sputtering using hollow cathode discharge. Auger spectra show that the nitrogen content is about 20-25 at.% in the hulk. Infrared (IR) spectra display three broad absorption bands. Alter heating treatment changes of IR spectra suggest that the nitrogen incorporating in the bonding network of amorphous is thermally stable and hydrogen content decreases.
收录类别	SCI
语种	英语
公开日期	2013-09-24
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/51899]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Zhao, J,Kang, N,Xu, JR. Reactive sputter deposition of carbon nitride films by using hollow-cathode discharge[J]. CHINESE PHYSICS LETTERS,1996,13(4):305.
APA	Zhao, J,Kang, N,&Xu, JR.(1996).Reactive sputter deposition of carbon nitride films by using hollow-cathode discharge.CHINESE PHYSICS LETTERS,13(4),305.
MLA	Zhao, J,et al."Reactive sputter deposition of carbon nitride films by using hollow-cathode discharge".CHINESE PHYSICS LETTERS 13.4(1996):305.