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Influence of growth temperature on formation of continuous Ag thin film on ZnO surface by ultra-high vacuum deposition
Zhang, TC ; Mei, ZX ; Guo, Y ; Xue, QK ; Du, XL
刊名JOURNAL OF PHYSICS D-APPLIED PHYSICS
2009
卷号42期号:6
关键词OXIDE SURFACES METAL-FILMS PARTICLES MGO(100) STM CU
ISSN号0022-3727
通讯作者Zhang, TC: Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China.
中文摘要Growth of an Ag film on a ZnO (0 0 0 1) surface by ultra-high vacuum deposition has been investigated by field emission scanning electron microscopy. It is revealed that the growth temperature has a considerable effect on the formation of a continuous Ag thin film on a ZnO surface. At room temperature or above, the formation of continuous Ag films with small thickness was found to be difficult due to an upstepping mechanism, whereas a continuous Ag film as thin as 30 nm was achieved at 140 K, resulting from the reduced migration length of silver atoms and the increased saturated island density at low temperature. Coalescence between the islands occurred and predominated over upstepping during subsequent deposition, which is favourable for the formation of a continuous Ag film with a smaller thickness.
收录类别SCI
资助信息National Science Foundation [50532090, 60606023, 60621091, 10804126]; Ministry of Science and Technology [2007CB 936203, 2009CB929400]; Chinese Academy of Sciences
语种英语
公开日期2013-09-17
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/39826]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhang, TC,Mei, ZX,Guo, Y,et al. Influence of growth temperature on formation of continuous Ag thin film on ZnO surface by ultra-high vacuum deposition[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2009,42(6).
APA Zhang, TC,Mei, ZX,Guo, Y,Xue, QK,&Du, XL.(2009).Influence of growth temperature on formation of continuous Ag thin film on ZnO surface by ultra-high vacuum deposition.JOURNAL OF PHYSICS D-APPLIED PHYSICS,42(6).
MLA Zhang, TC,et al."Influence of growth temperature on formation of continuous Ag thin film on ZnO surface by ultra-high vacuum deposition".JOURNAL OF PHYSICS D-APPLIED PHYSICS 42.6(2009).
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