Mechanism for resistive switching in an oxide-based electrochemical metallization memory
李润伟、诸葛飞 ; Shanshan Peng, Fei Zhuge,a) Xinxin Chen, Xiaojian Zhu, Benlin Hu, Liang Pan, Bin Chen, and Run-Wei Lia
刊名APPLIED PHYSICS LETTERS
2012-02-13
卷号111页码:072101-1—072101-4
通讯作者李润伟、诸葛飞
合作状况李雨桐
中文摘要A comparison of the asymmetric OFF-state current-voltage characteristics between Cu/ZnO/Pt and Cu/ZnO/Al-doped ZnO (AZO) electrochemical metallization memory (ECM) cells demonstrates that the Cu filament rupture and rejuvenation occur at the ZnO/Pt (or AZO) interface, i.e., the cathodic interface. Therefore, the filament is most likely to have a conical shape, with wider and narrower diameters formed at the anodic and cathodic interfaces, respectively. It is inferred that the filament growth starts at the anode surface and stops at the cathode surface. Our results indicate that oxide-based ECM cells strongly differ from sulfide- and selenide-based ones in the resistive switching mechanism. VC 2012 American Institute of Physics.
学科主题磁电子材料与器件
原文出处SCI收录
公开日期2013-12-16
内容类型期刊论文
源URL[http://ir.nimte.ac.cn/handle/174433/9555]  
专题宁波材料技术与工程研究所_宁波所知识产出
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GB/T 7714
李润伟、诸葛飞,Shanshan Peng, Fei Zhuge,a) Xinxin Chen, Xiaojian Zhu, Benlin Hu, Liang Pan, Bin Chen, and Run-Wei Lia. Mechanism for resistive switching in an oxide-based electrochemical metallization memory[J]. APPLIED PHYSICS LETTERS,2012,111:072101-1—072101-4.
APA 李润伟、诸葛飞,&Shanshan Peng, Fei Zhuge,a) Xinxin Chen, Xiaojian Zhu, Benlin Hu, Liang Pan, Bin Chen, and Run-Wei Lia.(2012).Mechanism for resistive switching in an oxide-based electrochemical metallization memory.APPLIED PHYSICS LETTERS,111,072101-1—072101-4.
MLA 李润伟、诸葛飞,et al."Mechanism for resistive switching in an oxide-based electrochemical metallization memory".APPLIED PHYSICS LETTERS 111(2012):072101-1—072101-4.
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