Influence of Ar Ion Sputter-Etching on XPS Analysis of Ti-Si-C Nanocomposite Film

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	Influence of Ar Ion Sputter-Etching on XPS Analysis of Ti-Si-C Nanocomposite Film
	Jiang Jinlong 1,2; Chen Di 1; Wang Qiong 1; Yang Hua 1; Wei Zhiqiang 1
刊名	RARE METAL MATERIALS AND ENGINEERING
	2014-04
卷号	43 期号:4 页码:977-981
关键词	Ti-Si-C nanocomposite films Ar+ sputter-etching XPS bonding configurations
ISSN号	1002-185X
英文摘要	The Ti-Si-C nanocomposite film was deposited in gas mixtures of Ar and CH4 by middle frequency unbalanced magnetron sputtering Ti80Si20 composite targets. The microstructure of the film was investigated by X-ray diffraction, Raman spectrum and X-ray photoelectron spectroscopy. The results show that the film exhibits nc-TiC/a-C:Si:H nanocomposite structure with about 10 nm nanocrystallites TiC embedded in hydrocarbon (a-C:Si:H) matrix. The results of XPS analysis strongly depend on Ar+ sputter-etching. The C and O content on the film surface distinctly decreases, while the Ti and Si content gradually increase with the increasing of Ar+ sputter-etching time. It is found that Ar+ sputter-etching results in the graphitization of the amorphous carbon phase in the nanocomposite film. In other words, the sp(3)C-C(H)/sp(2)C-C ratio decreases with the increasing of Ar+ sputter-etching time. In addition, the C-Ti/C-Ti and C-(Ti+Ti)/C-C ratios obviously increase.
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
语种	中文
出版者	NORTHWEST INST NONFERROUS METAL RESEARCH
WOS记录号	WOS:000335487800043
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/34428]
专题	理学院
作者单位	1.Lanzhou Univ Technol, Lanzhou 730050, Peoples R China; 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Jiang Jinlong,Chen Di,Wang Qiong,et al. Influence of Ar Ion Sputter-Etching on XPS Analysis of Ti-Si-C Nanocomposite Film[J]. RARE METAL MATERIALS AND ENGINEERING,2014,43(4):977-981.
APA	Jiang Jinlong,Chen Di,Wang Qiong,Yang Hua,&Wei Zhiqiang.(2014).Influence of Ar Ion Sputter-Etching on XPS Analysis of Ti-Si-C Nanocomposite Film.RARE METAL MATERIALS AND ENGINEERING,43(4),977-981.
MLA	Jiang Jinlong,et al."Influence of Ar Ion Sputter-Etching on XPS Analysis of Ti-Si-C Nanocomposite Film".RARE METAL MATERIALS AND ENGINEERING 43.4(2014):977-981.