Facet passivation process of high-power laser diodes by plasma cleaning and ZnO film
Lan, Yu3,4; Yang, Guowen2,3,4; Zhao, Yuliang3,4; Liu, Yuxian3,4; Demir, Abdullah1
刊名Applied Surface Science
2022-09-15
卷号596
关键词Laser diodes Facet passivation High reliability
ISSN号01694332
DOI10.1016/j.apsusc.2022.153506
产权排序1
英文摘要Passivation of dangling bonds at the cleaved mirror facet and its durability are fundamental features of semiconductor lasers to obtain reliable operation with a long device lifetime. The high non-radiative recombination activity of the surface states needs to be controlled to prevent the Fermi level pinning before the deposition of mirror coating materials. Here, we report the incorporation of plasma cleaning of the facet and ZnO film as a passivation layer for the fabrication of high-power semiconductor lasers. The Argon plasma cleaning process was investigated to eliminate surface contamination without damaging the cavity surface. The ZnO passivation films were systematically studied by varying the chamber pressure and sputtering power of the radio frequency (RF) sputter coating process. We obtained homogeneous and dense ZnO films with high surface quality and optical absorption coefficient of zero. By incorporating the optimum plasma cleaning and passivation layer parameters, GaAs-based laser devices with significantly improved catastrophic optical mirror damage (COMD) power were achieved. COMD threshold was increased from 11.9 W to 20.7 W. The life test results demonstrate no failure for facet cleaned and passivated devices for more than 500 h, confirming the long-term effectiveness of the process for actual device integration. © 2022 Elsevier B.V.
语种英语
出版者Elsevier B.V.
内容类型期刊论文
源URL[http://ir.opt.ac.cn/handle/181661/95894]  
专题西安光学精密机械研究所_瞬态光学技术国家重点实验室
作者单位1.Bilkent University, UNAM - Institute of Materials Science and Nanotechnology, Ankara; 06800, Turkey
2.Dogain Laser Technology (Suzhou) Co., Ltd., Suzhou; 215123, China;
3.University of Chinese Academy of Sciences, Beijing; 100049, China;
4.State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an; 710119, China;
推荐引用方式
GB/T 7714
Lan, Yu,Yang, Guowen,Zhao, Yuliang,et al. Facet passivation process of high-power laser diodes by plasma cleaning and ZnO film[J]. Applied Surface Science,2022,596.
APA Lan, Yu,Yang, Guowen,Zhao, Yuliang,Liu, Yuxian,&Demir, Abdullah.(2022).Facet passivation process of high-power laser diodes by plasma cleaning and ZnO film.Applied Surface Science,596.
MLA Lan, Yu,et al."Facet passivation process of high-power laser diodes by plasma cleaning and ZnO film".Applied Surface Science 596(2022).
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace