Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited) | |
H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang | |
刊名 | Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering |
2020 | |
卷号 | 49期号:12 |
ISSN号 | 10072276 |
DOI | 10.3788/IRLA20201077 |
英文摘要 | Vertical-cavity surface-emitting lasers (VCSELs) have important applications in the short-distance optical interconnection attributed to their advantages, such as low cost, low threshold current, high modulation bandwidth and low power consumption. With the development of big-data and supercomputer technology, the performance demand of short-distance optical interconnection is increasing quickly, which also proposes a challenge for high-speed 850 nm VCSEL. In this paper, the latest development of high-speed 850 nm VCSEL technology was reviewed from the aspects of bandwidth-limited factors and new modulation methods, and the growing trend of this technology is prospected and summarized. Copyright 2020 Infrared and Laser Engineering. All rights reserved. |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
源URL | [http://ir.ciomp.ac.cn/handle/181722/64291] |
专题 | 中国科学院长春光学精密机械与物理研究所 |
推荐引用方式 GB/T 7714 | H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang. Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited)[J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,2020,49(12). |
APA | H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang.(2020).Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited).Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,49(12). |
MLA | H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang."Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited)".Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering 49.12(2020). |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论