Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography

doi:J. Micromech. Microeng. 31 (2021) 075004 (8pp)

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 先进润滑与防护材料研究发展中心

	Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography
	Zhou B(周波)2,3; Su B(苏博)2; Wurui, Ta 1; Zenghui Yang 2; Meng JH(孟军虎)2,3
刊名	Journal of Micromechanics and Microengineering
	2021
卷号	30 期号:2021 页码:075004
DOI	J. Micromech. Microeng. 31 (2021) 075004 (8pp)
英文摘要	The soft lithographic fabrication of high-aspect-ratio polydimethylsiloxane (PDMS) microstructures is quite challenging because of the strong interfacial adhesion between them and masters during demolding. This paper presents a simple method for fabricating high-aspect-ratio PDMS microstructures by reducing the interfacial adhesion through the cooling process. The effect of cooling process on the topography, elastic property, and adhesion property of Sylgard 184 PDMS is studied. It is found that wrinkles are formed on the surface of PDMS and that the Young’s modulus of PDMS is increased by the air cooling process. Consequently, the air-cooled PDMS has lower adhesion than the traditional oven-cooled PDMS. This result could be explained by the adhesion parameter theory: both the high amplitude of the wrinkles formed on the surface of PDMS and the high Young’s modulus of PDMS increase separation forces and reduce adhesive forces in the interface. Application of this method is demonstrated by fabricating PDMS microchannels from a silicon master which has microstructures with different aspect ratios. Compared with PDMS microchannels obtained by the oven cooling process, PDMS microchannels with a depth of 200 µm and an aspect ratio of 10 are successfully fabricated by the air cooling process.
语种	英语
WOS记录号	IOP:0960-1317-31-7-AC00C8
内容类型	期刊论文
源URL	[http://ir.licp.cn/handle/362003/27899]
专题	兰州化学物理研究所_先进润滑与防护材料研究发展中心
通讯作者	Wurui, Ta; Meng JH(孟军虎)
作者单位	1.Key Laboratory of Mechanics on Western Disaster and Environment (Ministry of Education), College of Civil Engineering and Mechanics 2.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics 3.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences
推荐引用方式 GB/T 7714	Zhou B,Su B,Wurui, Ta,et al. Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography[J]. Journal of Micromechanics and Microengineering,2021,30(2021):075004.
APA	Zhou B,Su B,Wurui, Ta,Zenghui Yang,&Meng JH.(2021).Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography.Journal of Micromechanics and Microengineering,30(2021),075004.
MLA	Zhou B,et al."Fabrication of high-aspect-ratio polydimethylsiloxane microstructures by reducing the interfacial adhesion in soft lithography".Journal of Micromechanics and Microengineering 30.2021(2021):075004.