The preparation of SiC ceramic photosensitive slurry for rapid stereolithography

doi:10.1016/j.jeurceramsoc.2021.08.029

CORC > 自动化研究所 > 中国科学院自动化研究所 > 复杂系统管理与控制国家重点实验室 > 先进控制与自动化团队

	The preparation of SiC ceramic photosensitive slurry for rapid stereolithography
	Tang, Jie 1,3; Guo, Xiaotian 1,3; Chang, Haotian 1,3; Hu, Kehui 4,5; Shen, Zhen 2; Wang, Weixing ; Liu, Meng 1,3; Wei, Yuquan 1,3; Huang, Zhengren 1,3; Yang, Yong 1,3
刊名	JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
	2021-12-01
卷号	41 期号:15 页码:7516-7524
关键词	Stereolithography Graded SiO2 3D printing SiC ceramic slurry
ISSN号	0955-2219
DOI	10.1016/j.jeurceramsoc.2021.08.029
通讯作者	Huang, Zhengren(zhrhuang@mail.sic.ac.cn) ; Yang, Yong(yangyong@mail.sic.ac.cn)
英文摘要	Stereolithography is one of the most widely used additive manufacturing techniques for preparing high precision and complex ceramic components. Due to the high optical absorbance and refractive index of SiC powder, the rapid stereolithography of SiC ceramics components has become a key challenge. Here, we innovatively use graded silica to improve the curing thickness, rheological and settling performance of the slurry. And we presented a preparation method of SiC ceramic slurry for stereolithography with high solid content, low viscosity, low sedimentation rate and high curing thickness. The printable precision of the slurry is more than 75 mu m, the dynamic viscosity is less than 2 Pa.s, and the 24 h sedimentation height is less than 5%. This strategy demonstrates a tantalizing possibility and promising prospect to rapid stereolithography of large size SiC ceramic green body.
资助项目	Research instrument development project of Chinese Academy of Sciences[YZQT014]
WOS关键词	MATRIX COMPOSITES ; FABRICATION ; INFILTRATION ; SUSPENSIONS ; BEHAVIOR ; SPACE
WOS研究方向	Materials Science
语种	英语
出版者	ELSEVIER SCI LTD
WOS记录号	WOS:000705188500005
资助机构	Research instrument development project of Chinese Academy of Sciences
内容类型	期刊论文
源URL	[http://ir.ia.ac.cn/handle/173211/46167]
专题	自动化研究所_复杂系统管理与控制国家重点实验室_先进控制与自动化团队
通讯作者	Huang, Zhengren; Yang, Yong
作者单位	1.Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China 2.Chinese Acad Sci, Inst Automat, State Key Lab Management & Control Complex Syst, Beijing, Peoples R China 3.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China 4.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China 5.Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China
推荐引用方式 GB/T 7714	Tang, Jie,Guo, Xiaotian,Chang, Haotian,et al. The preparation of SiC ceramic photosensitive slurry for rapid stereolithography[J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,2021,41(15):7516-7524.
APA	Tang, Jie.,Guo, Xiaotian.,Chang, Haotian.,Hu, Kehui.,Shen, Zhen.,...&Yang, Yong.(2021).The preparation of SiC ceramic photosensitive slurry for rapid stereolithography.JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,41(15),7516-7524.
MLA	Tang, Jie,et al."The preparation of SiC ceramic photosensitive slurry for rapid stereolithography".JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 41.15(2021):7516-7524.