Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack

	Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack
	Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu
刊名	Journal of Applied Physics
	2019
卷号	126 期号:6 页码:065104
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/29405]
专题	半导体研究所_半导体超晶格国家重点实验室
推荐引用方式 GB/T 7714	Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu. Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack[J]. Journal of Applied Physics,2019,126(6):065104.
APA	Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu.(2019).Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack.Journal of Applied Physics,126(6),065104.
MLA	Qi Hu; Zhiqiang Fan; Anping Huang; Xinjiang Zhang; Rumeng Zhao; Qin Gao; Yuhang Ji; Wenzhen Dou; Mei Wang; Hongliang Shi; Zhisong Xiao; Xiangwei Jiang; Paul K. Chu."Competitive conductive mechanism of interstitial Ag and oxygen vacancies in Ag/Ta 2 O 5 /Pt stack".Journal of Applied Physics 126.6(2019):065104.