Particle flux characteristics of a compact high-field cascaded arc plasma device

doi:10.1088/2058-6272/ac1fd8

	Particle flux characteristics of a compact high-field cascaded arc plasma device
	YUAN,Xiaogang 1,2; ZHOU,Haishan 1,2; LIU,Haodong 1; LI,Bo 1,2; WANG,Yong 1; CHANG,Lei 1,2; YANG,Xin 1; WANG,Chuang 1; ZHANG,Lupeng 1,2; LUO,Guangnan 1,2
刊名	Plasma Science and Technology
	2021-09-24
卷号	23
关键词	cascaded arc plasma plasma-wall interaction ion flux vacuum design linear plasma device
ISSN号	1009-0630
DOI	10.1088/2058-6272/ac1fd8
通讯作者	ZHOU,Haishan()
英文摘要	Abstract A new compact cascaded arc device for plasma-wall interaction study is developed at the Institute of Plasma Physics, Chinese Academy of Sciences. A magnetic field up to 0.8 T is achieved to confine plasmas in a 1.2 m long and 0.1 m diameter vacuum chamber. Gas fluid type analysis in this compact vacuum system was done under high particle flux condition. The gas pressure obtained by calculation was consistent with the measurement result. Continuous argon plasma discharge with ion flux of ～0.5?×?1024 m?2 s?1 is successfully sustained for more than 1 h. The effects of magnetic field configuration, gas flow rate, and discharge arc current on the ion flux to target were studied in detail.
语种	英语
出版者	IOP Publishing
WOS记录号	IOP:1009-0630-23-11-AC1FD8
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn:8080/handle/334002/125387]
专题	中国科学院合肥物质科学研究院
通讯作者	ZHOU,Haishan
作者单位	1.Institute of Plasma Physics, HFIPS, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China 2.University of Science and Technology of China, Hefei 230026, People’s Republic of China
推荐引用方式 GB/T 7714	YUAN,Xiaogang,ZHOU,Haishan,LIU,Haodong,et al. Particle flux characteristics of a compact high-field cascaded arc plasma device[J]. Plasma Science and Technology,2021,23.
APA	YUAN,Xiaogang.,ZHOU,Haishan.,LIU,Haodong.,LI,Bo.,WANG,Yong.,...&LUO,Guangnan.(2021).Particle flux characteristics of a compact high-field cascaded arc plasma device.Plasma Science and Technology,23.
MLA	YUAN,Xiaogang,et al."Particle flux characteristics of a compact high-field cascaded arc plasma device".Plasma Science and Technology 23(2021).