Solid-State Dewetting in Polycrystalline Co Films on Native Oxide Si(100) by Kirkendall Effects | |
Zhao, Yue1; Wang, Kai1; Yuan, Shuang3; Li, Guojian1; Ma, Yonghui2; Wang, Qang1 | |
刊名 | JOURNAL OF PHYSICAL CHEMISTRY C |
2019-08-15 | |
卷号 | 123期号:32页码:19572-19578 |
ISSN号 | 1932-7447 |
DOI | 10.1021/acs.jpcc.9b04226 |
通讯作者 | Li, Guojian(gjli@mail.neu.edu.cn) |
英文摘要 | The polycrystalline Co films with a thickness of 120 nm were deposited on the native oxide Si(100) substrate. |
资助项目 | National Natural Science Foundation of China[51425401] ; National Natural Science Foundation of China[51690162] ; Liaoning Innovative Research Team in University[LT2017011] ; Fundamental Research Funds for the Central Universities[N160907001] ; Fundamental Research Funds for the Central Universities[N180912004] |
WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science |
语种 | 英语 |
出版者 | AMER CHEMICAL SOC |
WOS记录号 | WOS:000481568900035 |
资助机构 | National Natural Science Foundation of China ; Liaoning Innovative Research Team in University ; Fundamental Research Funds for the Central Universities |
内容类型 | 期刊论文 |
源URL | [http://ir.imr.ac.cn/handle/321006/134854] |
专题 | 金属研究所_中国科学院金属研究所 |
通讯作者 | Li, Guojian |
作者单位 | 1.Northeastern Univ, Sch Met, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 3.Northeastern Univ, Sch Met, Dept New Energy Sci & Engn, Shenyang 110819, Liaoning, Peoples R China |
推荐引用方式 GB/T 7714 | Zhao, Yue,Wang, Kai,Yuan, Shuang,et al. Solid-State Dewetting in Polycrystalline Co Films on Native Oxide Si(100) by Kirkendall Effects[J]. JOURNAL OF PHYSICAL CHEMISTRY C,2019,123(32):19572-19578. |
APA | Zhao, Yue,Wang, Kai,Yuan, Shuang,Li, Guojian,Ma, Yonghui,&Wang, Qang.(2019).Solid-State Dewetting in Polycrystalline Co Films on Native Oxide Si(100) by Kirkendall Effects.JOURNAL OF PHYSICAL CHEMISTRY C,123(32),19572-19578. |
MLA | Zhao, Yue,et al."Solid-State Dewetting in Polycrystalline Co Films on Native Oxide Si(100) by Kirkendall Effects".JOURNAL OF PHYSICAL CHEMISTRY C 123.32(2019):19572-19578. |
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