Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films

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	Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films
	Zhao Yanhui 1; Zhao Shengsheng 3; Ren Ling 1; Denisov, V. V.2; Koval, N. N.2; Yang Ke 1; Yu Baohai 1
刊名	RARE METAL MATERIALS AND ENGINEERING
	2018-11-01
卷号	47 期号:11 页码:3284-3288
关键词	arc ion plating magnetic field pulse bias microstructure mechanical property
ISSN号	1002-185X
通讯作者	Zhao Yanhui(yhzhao@imr.ac.cn)
英文摘要	TiN/Cu nanocomposite films were deposited on high-speed steel (HSS) substrates by axial magnetic field-enhanced arc ion plating (AMFE-AIP). The effects of substrate bias voltage on chemical composition, microstructure, mechanical and tribological properties of the films were investigated by X-ray photoelectrons spectroscopy (XPS), X-ray diffraction (XRD), nanoindentation and wear measurements, respectively. The results show that the Cu content increases first and then decreases with the increase of the pulse bias voltage, being a low value in the range of 1.3 at%similar to 2.1 at%. XRD results show that only the TiN phase appears in all the films, and no Cu phase is observed. The preferred orientation of the films changes significantly with the increasing pulse bias voltage. A maximum value of hardness of 36 GPa is obtained under a pulse bias voltage of -200 V, corresponding to the film containing 1.6 at% Cu. Compared to the pure TiN film, the Cu addition in TiN films significantly improves the wear resistance.
资助项目	National Natural Science Foundation of China[51401128]
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
语种	英语
出版者	NORTHWEST INST NONFERROUS METAL RESEARCH
WOS记录号	WOS:000452694200006
资助机构	National Natural Science Foundation of China
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/130759]
专题	金属研究所_中国科学院金属研究所
通讯作者	Zhao Yanhui
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia 3.Shenzhen Polytech, Sch Mech & Elect Engn, Shenzhen 518055, Peoples R China
推荐引用方式 GB/T 7714	Zhao Yanhui,Zhao Shengsheng,Ren Ling,et al. Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films[J]. RARE METAL MATERIALS AND ENGINEERING,2018,47(11):3284-3288.
APA	Zhao Yanhui.,Zhao Shengsheng.,Ren Ling.,Denisov, V. V..,Koval, N. N..,...&Yu Baohai.(2018).Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films.RARE METAL MATERIALS AND ENGINEERING,47(11),3284-3288.
MLA	Zhao Yanhui,et al."Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films".RARE METAL MATERIALS AND ENGINEERING 47.11(2018):3284-3288.