Highly reproducible and stable surface-enhanced Raman scattering substrates of graphene-Ag nanohole arrays fabricated by sub-diffraction plasmonic lithography

doi:10.1364/OSAC.2.000582

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Highly reproducible and stable surface-enhanced Raman scattering substrates of graphene-Ag nanohole arrays fabricated by sub-diffraction plasmonic lithography
	Gong, Tiancheng 1; Luo, Yunfei 1,3; Zhao, Chengwei 1,3; Yue, Weisheng 1; Zhang, Jie 2; Zhu, Yong 2; Pu, Mingbo 1; Zhang, Zuojun 1; Wang, Changtao 1; Luo, Xiangang 1
刊名	OSA Continuum
	2019-03-15
卷号	2 期号:3 页码:582-594
DOI	10.1364/OSAC.2.000582
文献子类	期刊论文
英文摘要	Surface-enhanced Raman scattering (SERS) has shown great promise for trace detection due to its high sensitivity. The lack of efficient fabrication methods for large-scale SERS substrates with high sensitivity, high reproducibility, and stability has greatly limited the development of practical SERS sensing devices. In this work, we report sub-diffraction, high throughput, and low-cost fabrication of SERS substrates with plasmonic cavity lens (PCL) lithography. The PCL is a photoresist layer sandwiched with two Ag layers, which could greatly improve the lithographic resolution and fidelity. Ag nanohole arrays (AgNHs) over a 5 × 5 mm2 area were fabricated onto the bottom Ag reflective layer, which worked as SERS substrates. The SERS substrates exhibited enhancement factors (EFs) of 107 that are capable of monolayer detection. The reproducibility is less than 9%, which is much better than that of substrates synthesized with traditional chemical methods. The graphene (GE) layer was transferred onto AgNHs to increase the SERS stability, as demonstrated with only a 25.8% decrease of SERS intensity for 90 day exposure to air and a 78.3% decrease for the control case without GE. This work has demonstrated that PCL lithography technique is a promising method for fabrication of SERS substrates with large-area, high sensitivity, high reproducibility, and low-cost. © 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
语种	英语
出版者	OSA - The Optical Society
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9786]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China; 2.Key Laboratory of Optoelectronic Technology and System, Education Ministry of China, Chongqing University, Chongqing; 400044, China 3.University of Chinese Academy of Sciences, Beijing; 100049, China;
推荐引用方式 GB/T 7714	Gong, Tiancheng,Luo, Yunfei,Zhao, Chengwei,et al. Highly reproducible and stable surface-enhanced Raman scattering substrates of graphene-Ag nanohole arrays fabricated by sub-diffraction plasmonic lithography[J]. OSA Continuum,2019,2(3):582-594.
APA	Gong, Tiancheng.,Luo, Yunfei.,Zhao, Chengwei.,Yue, Weisheng.,Zhang, Jie.,...&Luo, Xiangang.(2019).Highly reproducible and stable surface-enhanced Raman scattering substrates of graphene-Ag nanohole arrays fabricated by sub-diffraction plasmonic lithography.OSA Continuum,2(3),582-594.
MLA	Gong, Tiancheng,et al."Highly reproducible and stable surface-enhanced Raman scattering substrates of graphene-Ag nanohole arrays fabricated by sub-diffraction plasmonic lithography".OSA Continuum 2.3(2019):582-594.