The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films

doi:10.3390/coatings9050307

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 薄膜光学技术研究室（十一室）

	The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films
	Kong, Mingdong 3; Li, Bincheng 2; Guo, Chun ; Zeng, Peng ; Wei, Ming ; He, Wenyan 3
刊名	COATINGS
	2019-05-01
卷号	9 期号:5
关键词	HfO2 thin films optical absorption photoluminescence electron-beam deposition ion-assisted deposition (IAD)
ISSN号	2079-6412
DOI	10.3390/coatings9050307
文献子类	期刊论文
英文摘要	HfO2 thin films are extensively applied in optical coatings and microelectronic devices. However, film defects, which are vital to the performance of the thin films, are still under intense investigation. In this work, the absorption, photoluminescence, and crystallization characteristics of HfO2 films prepared by electron-beam evaporation and ion-assisted deposition are investigated in detail. Experimental results showed that high-temperature thermal annealing in air resulted in a reduced absorption coefficient, an increased bandgap width, and an increased degree of crystallization. After thermal annealing, an absorption shoulder near 5.8 eV was caused by excitons in the films, which were independent of oxygen vacancy defects and crystallization. Under 6.4 eV (193 nm) laser excitation, the photoluminescence spectrum showed five emission peaks for HfO2 films both with and without thermal annealing. The emission peak near 4.4 eV was generated by the self-trapped exciton, and the peak near 4.0 eV was related to the OH group in the film. The oxygen vacancy defect-induced absorption of HfO2 films in a broad spectral range significantly increased when HfO2 film was re-annealed in Ar gas after first being annealed in air, while the photoluminescence spectrum showed no significant change, indicating that the emission peaks at 2.3, 2.8, and 3.4 eV were not related to oxygen vacancy defects.
出版地	BASEL
WOS关键词	LUMINESCENCE ; DEPOSITION ; DEFECTS ; STRESS ; HAFNIA
WOS研究方向	Materials Science, Coatings & Films
语种	英语
出版者	MDPI
WOS记录号	WOS:000478810800028
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9686]
专题	光电技术研究所_薄膜光学技术研究室（十一室）
作者单位	1.Univ Elect Sci & Technol China, Sch Optoelect Sci & Engn, Chengdu 610054, Peoples R China 2.Chinese Acad Sci, Beijing 100039, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
推荐引用方式 GB/T 7714	Kong, Mingdong,Li, Bincheng,Guo, Chun,et al. The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films[J]. COATINGS,2019,9(5).
APA	Kong, Mingdong,Li, Bincheng,Guo, Chun,Zeng, Peng,Wei, Ming,&He, Wenyan.(2019).The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films.COATINGS,9(5).
MLA	Kong, Mingdong,et al."The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films".COATINGS 9.5(2019).