Semiconductor laser | |
IWANO HIDEAKI | |
1988-04-04 | |
著作权人 | SEIKO EPSON CORP |
专利号 | JP1988073581A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Semiconductor laser |
英文摘要 | PURPOSE:To obtain a semiconductor laser, which has small oscillation threshold current density, generates single transverse mode oscillation and can be manufactured with excellent yield in a uniform large area, by specifying a buried semiconductor layer from the periodic table and changing the semiconductor layer into a semi-insulating compound semiconductor layer. CONSTITUTION:When a II-VI compound semiconductor layer 103 consists of ZnSl, it has index difference extremely larger than the refractive index of an active layer 109 composed of GaAs, etc., and the efficiency of optical confinement is improved, thus lowering injection current density. Since a II-VI compound semiconductor has an extremely large band gap, the resistivity of a thin-film through an MOCVD method is increased, and the buried layer 103 can prevent inJection currents completely. Consequently, threshold current density can further be lowered. The active layer 109 is inverted-mesa-etched in a striped manner, and the buried layer 103 is shaped, thus acquiring a flat surface. The width of the actual active layer 109 is made narrower than that of a resist pattern in a photolithographic process, thus resulting in a single oscillation transverse mode, then allowing stable laser operation. |
公开日期 | 1988-04-04 |
申请日期 | 1986-09-16 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/87377] |
专题 | 半导体激光器专利数据库 |
作者单位 | SEIKO EPSON CORP |
推荐引用方式 GB/T 7714 | IWANO HIDEAKI. Semiconductor laser. JP1988073581A. 1988-04-04. |
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