Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD

doi:10.15541/jim20190035

	Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD
	Liao Chun-Jing; Dong Shao-Ming; Jin Xi-Hai; Hu Jian-Bao; Zhang Xiang-Yu; Wu Hui-Xia
刊名	JOURNAL OF INORGANIC MATERIALS
	2019-11-20
卷号	34 期号:11 页码:1231
关键词	silicon nitride coating growth kinetic deposition temperature chemical composition heat treatment
ISSN号	1000-324X
DOI	10.15541/jim20190035
文献子类	Article
英文摘要	Silicon nitride coatings on carbon fiber cloth were prepared by Low Pressure Chemical Vapor Deposition (LPCVD) from gas mixtures of SiCl4-NH3-H-2 at temperatures ranging from 750 degrees C to 1250 degrees C. The effects of deposition temperature on the growth kinetics, morphologies, chemical composition and bonding state of the coatings were investigated. The results showed that deposition rate increased monotonously with temperature up to 1050 , then it reversely decreased. In the whole temperature range, the coating surface morphology became gradually coarse with cauliflower-like grains as the deposition temperature increased. The optimal deposition temperature for infiltration was in the range between 750 and 950 degrees C. Chemical composition analysis demonstrated that the nitrogen content of the coating firstly decreased and then increased with temperature increase, while the silicon content continuously increased and the oxygen content gradually decreased in the whole temperature range. Heat treatment at 1300 degrees C and above crystallized the coating. Concurrently, a significant change in its surface morphology was observed. All heat-treated coatings were exclusively composed of alpha-Si3N4, without the presence of any beta-Si3N4.
WOS研究方向	Materials Science
语种	英语
出版者	SCIENCE PRESS
内容类型	期刊论文
源URL	[http://ir.sic.ac.cn/handle/331005/26726]
专题	中国科学院上海硅酸盐研究所
推荐引用方式 GB/T 7714	Liao Chun-Jing,Dong Shao-Ming,Jin Xi-Hai,et al. Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD[J]. JOURNAL OF INORGANIC MATERIALS,2019,34(11):1231.
APA	Liao Chun-Jing,Dong Shao-Ming,Jin Xi-Hai,Hu Jian-Bao,Zhang Xiang-Yu,&Wu Hui-Xia.(2019).Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD.JOURNAL OF INORGANIC MATERIALS,34(11),1231.
MLA	Liao Chun-Jing,et al."Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD".JOURNAL OF INORGANIC MATERIALS 34.11(2019):1231.