The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF

doi:10.1107/S1600577518012833

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF
	Xue, CF ; Meng, XY ; Wu, YQ ; Wang, Y ; Wang, LS ; Yang, SM ; Zhao, J ; Tai, RZ
刊名	JOURNAL OF SYNCHROTRON RADIATION
	2018
卷号	25 期号:-页码:1869-1876
关键词	INTERFEROMETRIC LITHOGRAPHY FABRICATION PERFORMANCE BAND
ISSN号	1600-5775
DOI	10.1107/S1600577518012833
文献子类	期刊论文
英文摘要	A new spatially coherent beamline has been designed and constructed at the Shanghai Synchrotron Radiation Facility. Here, the design of the beamline is introduced and the spatial coherence is analyzed throughout the whole process by wave optics. The simulation results show good spatial coherence at the endstation and have been proven by experiment results.
语种	英语
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/31146]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位	1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China
推荐引用方式 GB/T 7714	Xue, CF,Meng, XY,Wu, YQ,et al. The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF[J]. JOURNAL OF SYNCHROTRON RADIATION,2018,25(-):1869-1876.
APA	Xue, CF.,Meng, XY.,Wu, YQ.,Wang, Y.,Wang, LS.,...&Tai, RZ.(2018).The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF.JOURNAL OF SYNCHROTRON RADIATION,25(-),1869-1876.
MLA	Xue, CF,et al."The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF".JOURNAL OF SYNCHROTRON RADIATION 25.-(2018):1869-1876.