Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering
Zuo, Xiao; Chen, Rende; Ke, Peiling; Wang, Aiying
刊名IEEE TRANSACTIONS ON PLASMA SCIENCE
2019
卷号47期号:2页码:1215-1222
关键词HIPIMS COATINGS DEPOSITION FILMS MICROSTRUCTURE
DOI10.1109/TPS.2018.2889696
英文摘要Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering
内容类型期刊论文
源URL[http://ir.nimte.ac.cn/handle/174433/18591]  
专题2019专题
作者单位1.Ke, PL
2.Wang, AY (reprint author), Chinese Acad Sci, Key Lab Marine Mat & Related Technol, Zhejiang Key Lab Marine Mat & Protect Technol, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China.
推荐引用方式
GB/T 7714
Zuo, Xiao,Chen, Rende,Ke, Peiling,et al. Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering[J]. IEEE TRANSACTIONS ON PLASMA SCIENCE,2019,47(2):1215-1222.
APA Zuo, Xiao,Chen, Rende,Ke, Peiling,&Wang, Aiying.(2019).Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering.IEEE TRANSACTIONS ON PLASMA SCIENCE,47(2),1215-1222.
MLA Zuo, Xiao,et al."Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering".IEEE TRANSACTIONS ON PLASMA SCIENCE 47.2(2019):1215-1222.
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